Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9261793 | Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution | Martin Burkhardt | 2016-02-16 |
| 9086639 | Fabrication of on-product aberration monitors with nanomachining | — | 2015-07-21 |
| 9052617 | Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks | Emily Gallagher, Alfred Wagner | 2015-06-09 |
| 8765331 | Reducing edge die reflectivity in extreme ultraviolet lithography | Emily Gallagher | 2014-07-01 |
| 8769474 | Fast pattern matching | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2014-07-01 |
| 8748063 | Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks | Emily Gallagher, Alfred Wagner | 2014-06-10 |
| 8679708 | Polarization monitoring reticle design for high numerical aperture lithography systems | Timothy A. Brunner | 2014-03-25 |
| 8631373 | Yield analysis with situations | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2014-01-14 |
| 8546069 | Method for enhancing lithographic imaging of isolated and semi-isolated features | Wu-Song Huang | 2013-10-01 |
| 8368890 | Polarization monitoring reticle design for high numerical aperture lithography systems | Timothy A. Brunner | 2013-02-05 |
| 8365103 | System and method for implementing image-based design rules | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2013-01-29 |
| 8327299 | System and method for implementing image-based design rules | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2012-12-04 |
| 8091047 | System and method for implementing image-based design rules | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2012-01-03 |
| 8031330 | Mixed polarization state monitoring | — | 2011-10-04 |
| 7831942 | Design check database | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2010-11-09 |
| 7818707 | Fast pattern matching | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2010-10-19 |
| 7752577 | Constraint plus pattern | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2010-07-06 |
| 7707542 | Creating a situation repository | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2010-04-27 |
| 7661087 | Yield analysis with situations | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2010-02-09 |
| 7653892 | System and method for implementing image-based design rules | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2010-01-26 |
| 7648802 | Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems | Andrew Neureuther | 2010-01-19 |
| 7418693 | System and method for analysis and transformation of layouts using situations | Frank E. Gennari, Ya-Chieh Lai, Matthew W. Moskewicz, Michael C. Lam | 2008-08-26 |
| 7224458 | Phase-shifting test mask patterns for characterizing illumination polarization balance in image forming optical systems | Andrew Neureuther | 2007-05-29 |