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Method for forming an extreme ultraviolet lithography pellicle |
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Extreme ultraviolet lithography device |
Joern-Holger Franke |
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Induced stress for EUV pellicle tensioning |
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| 11092886 |
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Method for manufacturing a mask |
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Method for forming a carbon nanotube pellicle membrane |
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Lithographic reticle system |
Rik Jonckheere, Cedric Huyghebaert |
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| 9551924 |
Structure and method for fixing phase effects on EUV mask |
Martin Burkhardt |
2017-01-24 |
| 9052617 |
Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks |
Gregory R. McIntyre, Alfred Wagner |
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| 8765331 |
Reducing edge die reflectivity in extreme ultraviolet lithography |
Gregory R. McIntyre |
2014-07-01 |
| 8769445 |
Method for determining mask operation activities |
Jed H. Rankin, Alan E. Rosenbluth |
2014-07-01 |
| 8748063 |
Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks |
Gregory R. McIntyre, Alfred Wagner |
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| 8586950 |
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Brian N. Caldwell, Steven C. Nash, Jed H. Rankin |
2013-11-19 |
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| 7198872 |
Light scattering EUVL mask |
Louis M. Kindt, Carey Thiel |
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