Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Emily Gallagher — 17 Patents

IBM: 9 patents #11,946 of 70,183Top 20%
IVImec Vzw: 8 patents #57 of 1,046Top 6%
ICImec Usa Nanoelectronics Design Center: 3 patents #1 of 14Top 8%
KRKatholieke Universiteit Leuven, Ku Leuven R&D: 3 patents #48 of 512Top 10%
Burlington, VT: #39 of 475 inventorsTop 9%
Vermont: #451 of 4,968 inventorsTop 10%
Overall (All Time): #263,971 of 4,157,543Top 7%
17 Patents All Time
Emily Gallagher has been granted 17 US patents while listed as an inventor at IBM. The first was granted in 2007 and the most recent in March 2023. Emily Gallagher ranks #263,971 of 4,157,543 US inventors in our database (top 6.3%). Patent records list Emily Gallagher in Burlington, VT, US.

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11599019 Method for forming an extreme ultraviolet lithography pellicle Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans 2023-03-07
11360380 Extreme ultraviolet lithography device Joern-Holger Franke 2022-06-14
11181818 Lithography scanner Joern-Holger Franke, Ivan Pollentier, Marina Timmermans, Marina Mariano Juste 2021-11-23
11163229 Induced stress for EUV pellicle tensioning Marina Mariano Juste, Marina Timmermans, Ivan Pollentier, Cedric Huyghebaert 2021-11-02
11092886 Method for forming a pellicle Marina Timmermans, Ivan Pollentier, Hanns Christoph Adelmann, Cedric Huyghebaert, Jae Uk Lee 2021-08-17
10720336 Method for manufacturing a mask Roel Gronheid, Jan Doise, Iacopo Mochi 2020-07-21
10712659 Method for forming a carbon nanotube pellicle membrane Cedric Huyghebaert, Ivan Pollentier, Hanns Christoph Adelmann, Marina Timmermans, Jae Uk Lee 2020-07-14
10353284 Lithographic reticle system Rik Jonckheere, Cedric Huyghebaert 2019-07-16
9551924 Structure and method for fixing phase effects on EUV mask Martin Burkhardt 2017-01-24 $6,164,000
9052617 Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks Gregory R. McIntyre, Alfred Wagner 2015-06-09 $3,292,000
8765331 Reducing edge die reflectivity in extreme ultraviolet lithography Gregory R. McIntyre 2014-07-01 $3,868,000
8769445 Method for determining mask operation activities Jed H. Rankin, Alan E. Rosenbluth 2014-07-01 $3,868,000
8748063 Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks Gregory R. McIntyre, Alfred Wagner 2014-06-10 $4,765,000
8586950 Method and system for feature function aware priority printing Brian N. Caldwell, Steven C. Nash, Jed H. Rankin 2013-11-19 $3,686,000
8538129 Mask program defect test Karen D. Badger, Christoper Magg 2013-09-17 $4,204,000
8227774 Method and system for feature function aware priority printing Brian N. Caldwell, Steven C. Nash, Jed H. Rankin 2012-07-24 $4,383,000
7198872 Light scattering EUVL mask Louis M. Kindt, Carey Thiel 2007-04-03 $7,379,000