EG

Emily Gallagher

IBM: 9 patents #11,918 of 70,183Top 20%
IV Imec Vzw: 8 patents #57 of 1,046Top 6%
IC Imec Usa Nanoelectronics Design Center: 3 patents #1 of 14Top 8%
KR Katholieke Universiteit Leuven, Ku Leuven R&D: 3 patents #48 of 512Top 10%
Overall (All Time): #269,908 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11599019 Method for forming an extreme ultraviolet lithography pellicle Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans 2023-03-07
11360380 Extreme ultraviolet lithography device Joern-Holger Franke 2022-06-14
11181818 Lithography scanner Joern-Holger Franke, Ivan Pollentier, Marina Timmermans, Marina Mariano Juste 2021-11-23
11163229 Induced stress for EUV pellicle tensioning Marina Mariano Juste, Marina Timmermans, Ivan Pollentier, Cedric Huyghebaert 2021-11-02
11092886 Method for forming a pellicle Marina Timmermans, Ivan Pollentier, Hanns Christoph Adelmann, Cedric Huyghebaert, Jae Uk Lee 2021-08-17
10720336 Method for manufacturing a mask Roel Gronheid, Jan Doise, Iacopo Mochi 2020-07-21
10712659 Method for forming a carbon nanotube pellicle membrane Cedric Huyghebaert, Ivan Pollentier, Hanns Christoph Adelmann, Marina Timmermans, Jae Uk Lee 2020-07-14
10353284 Lithographic reticle system Rik Jonckheere, Cedric Huyghebaert 2019-07-16
9551924 Structure and method for fixing phase effects on EUV mask Martin Burkhardt 2017-01-24
9052617 Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks Gregory R. McIntyre, Alfred Wagner 2015-06-09
8765331 Reducing edge die reflectivity in extreme ultraviolet lithography Gregory R. McIntyre 2014-07-01
8769445 Method for determining mask operation activities Jed H. Rankin, Alan E. Rosenbluth 2014-07-01
8748063 Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks Gregory R. McIntyre, Alfred Wagner 2014-06-10
8586950 Method and system for feature function aware priority printing Brian N. Caldwell, Steven C. Nash, Jed H. Rankin 2013-11-19
8538129 Mask program defect test Karen D. Badger, Christoper Magg 2013-09-17
8227774 Method and system for feature function aware priority printing Brian N. Caldwell, Steven C. Nash, Jed H. Rankin 2012-07-24
7198872 Light scattering EUVL mask Louis M. Kindt, Carey Thiel 2007-04-03