IP

Ivan Pollentier

IV Imec Vzw: 5 patents #109 of 1,046Top 15%
IC Imec Usa Nanoelectronics Design Center: 2 patents #3 of 14Top 25%
KR Katholieke Universiteit Leuven, Ku Leuven R&D: 2 patents #80 of 512Top 20%
IM Imec: 1 patents #297 of 687Top 45%
IV Interuniversitair Micro-Electronica Centrum Vzw: 1 patents #167 of 450Top 40%
Overall (All Time): #702,423 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11599019 Method for forming an extreme ultraviolet lithography pellicle Marina Timmermans, Cedric Huyghebaert, Elie Schapmans, Emily Gallagher 2023-03-07
11181818 Lithography scanner Emily Gallagher, Joern-Holger Franke, Marina Timmermans, Marina Mariano Juste 2021-11-23
11163229 Induced stress for EUV pellicle tensioning Marina Mariano Juste, Marina Timmermans, Cedric Huyghebaert, Emily Gallagher 2021-11-02
11092886 Method for forming a pellicle Marina Timmermans, Emily Gallagher, Hanns Christoph Adelmann, Cedric Huyghebaert, Jae Uk Lee 2021-08-17
10712659 Method for forming a carbon nanotube pellicle membrane Emily Gallagher, Cedric Huyghebaert, Hanns Christoph Adelmann, Marina Timmermans, Jae Uk Lee 2020-07-14
9086638 Detection of contamination in EUV systems Rik Jonckheere, Anne-Marie Goethals, Gian Francesco Lorusso 2015-07-21
7528387 Methods and systems for characterising and optimising immersion lithographic processing 2009-05-05