LK

Louis M. Kindt

IBM: 11 patents #9,995 of 70,183Top 15%
📍 Colchester, VT: #63 of 432 inventorsTop 15%
🗺 Vermont: #658 of 4,968 inventorsTop 15%
Overall (All Time): #454,144 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
11143953 Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 Robert L. Sandstrom, Peter H. Bartlau, Thomas B. Faure, Supratik Guha, Edward W. Kiewra +1 more 2021-10-12
8758962 Method and apparatus for sub-pellicle defect reduction on photomasks Jay Burnham, Frances Anne Houle 2014-06-24
8173331 Method and apparatus for sub-pellicle defect reduction on photomasks Jay Burnham, Frances Anne Houle 2012-05-08
7826038 Method for adjusting lithographic mask flatness using thermally induced pellicle stress Emily Gallagher, James A. Slinkman, Richard E. Wistron 2010-11-02
7537114 System and method for storing and transporting photomasks in fluid Emily Gallagher 2009-05-26
7355680 Method for adjusting lithographic mask flatness using thermally induced pellicle stress Emily Gallagher, James A. Slinkman, Richard Wistrom 2008-04-08
7198276 Adaptive electrostatic pin chuck Brian N. Caldwell, Raymond W. Jeffer 2007-04-03
7198872 Light scattering EUVL mask Emily Gallagher, Carey Thiel 2007-04-03
7132206 Process and apparatus for minimizing thermal gradients across an advanced lithographic mask 2006-11-07
7049035 Method for controlling linewidth in advanced lithography masks using electrochemistry Carey Thiel 2006-05-23
6777137 EUVL mask structure and method of formation Emily E. Fisch, James P. Levin, Michael R. Schmidt, Carey T. Williams 2004-08-17