Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11599019 | Method for forming an extreme ultraviolet lithography pellicle | Marina Timmermans, Cedric Huyghebaert, Ivan Pollentier, Elie Schapmans | 2023-03-07 |
| 11360380 | Extreme ultraviolet lithography device | Joern-Holger Franke | 2022-06-14 |
| 11181818 | Lithography scanner | Joern-Holger Franke, Ivan Pollentier, Marina Timmermans, Marina Mariano Juste | 2021-11-23 |
| 11163229 | Induced stress for EUV pellicle tensioning | Marina Mariano Juste, Marina Timmermans, Ivan Pollentier, Cedric Huyghebaert | 2021-11-02 |
| 11092886 | Method for forming a pellicle | Marina Timmermans, Ivan Pollentier, Hanns Christoph Adelmann, Cedric Huyghebaert, Jae Uk Lee | 2021-08-17 |
| 10720336 | Method for manufacturing a mask | Roel Gronheid, Jan Doise, Iacopo Mochi | 2020-07-21 |
| 10712659 | Method for forming a carbon nanotube pellicle membrane | Cedric Huyghebaert, Ivan Pollentier, Hanns Christoph Adelmann, Marina Timmermans, Jae Uk Lee | 2020-07-14 |
| 10353284 | Lithographic reticle system | Rik Jonckheere, Cedric Huyghebaert | 2019-07-16 |
| 9551924 | Structure and method for fixing phase effects on EUV mask | Martin Burkhardt | 2017-01-24 |
| 9052617 | Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks | Gregory R. McIntyre, Alfred Wagner | 2015-06-09 |
| 8765331 | Reducing edge die reflectivity in extreme ultraviolet lithography | Gregory R. McIntyre | 2014-07-01 |
| 8769445 | Method for determining mask operation activities | Jed H. Rankin, Alan E. Rosenbluth | 2014-07-01 |
| 8748063 | Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks | Gregory R. McIntyre, Alfred Wagner | 2014-06-10 |
| 8586950 | Method and system for feature function aware priority printing | Brian N. Caldwell, Steven C. Nash, Jed H. Rankin | 2013-11-19 |
| 8538129 | Mask program defect test | Karen D. Badger, Christoper Magg | 2013-09-17 |
| 8227774 | Method and system for feature function aware priority printing | Brian N. Caldwell, Steven C. Nash, Jed H. Rankin | 2012-07-24 |
| 7198872 | Light scattering EUVL mask | Louis M. Kindt, Carey Thiel | 2007-04-03 |