Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Alan E. Rosenbluth — 106 Patents

IBM: 103 patents #530 of 70,183Top 1%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
URUniversity Of Rochester: 1 patents #496 of 1,162Top 45%
Yorktown Heights, NY: #20 of 858 inventorsTop 3%
New York: #496 of 115,490 inventorsTop 1%
Overall (All Time): #12,931 of 4,157,543Top 1%
106 Patents All Time
Alan E. Rosenbluth has been granted 106 US patents while listed as an inventor at IBM. The first was granted in 1982 and the most recent in July 2024. Alan E. Rosenbluth ranks #12,931 of 4,157,543 US inventors in our database (top 0.31%). Patent records list Alan E. Rosenbluth in Yorktown Heights, NY, US.

Issued Patents All Time

Showing 1–25 of 106 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12039402 Color-map method to eliminate qubit frequency crowding in a quantum computing chip Jared Barney Hertzberg, Dongbing Shao 2024-07-16 $23,207,000
10915686 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2021-02-09 $3,536,000
10872188 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2020-12-22 $76,512,000
10437950 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2019-10-08 $4,743,000
10394984 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2019-08-27 $1,335,000
10210295 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2019-02-19 $3,019,000
10120963 Figurative models calibrated to correct errors in process models Pardeep Kumar, Ramana Murthy Pusuluri, Ramya Viswanathan 2018-11-06 $15,674,000
9857676 Method and program product for designing source and mask for lithography Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2018-01-02 $1,907,000
9651856 Source, target and mask optimization by incorporating contour based assessments and integration over process variations Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2017-05-16 $2,370,000
9395622 Synthesizing low mask error enhancement factor lithography solutions Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2016-07-19 $2,452,000
9310674 Mask that provides improved focus control using orthogonal edges Jaione Tirapu Azpiroz, Timothy A. Brunner 2016-04-12 $2,843,000
9250535 Source, target and mask optimization by incorporating countour based assessments and integration over process variations Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2016-02-02 $1,325,000
8959462 Mask design method, program, and mask design system Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2015-02-17 $5,211,000
8954898 Source-mask optimization for a lithography process Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2015-02-10 $3,717,000
8910089 Printing process calibration and correction Samit Barai 2014-12-09 $5,061,000
8880382 Analyzing a patterning process using a model of yield Saeed Bagheri, Fook-Luen Heng, Rajiv V. Joshi, Kafai Lai, David O. Melville +3 more 2014-11-04 $3,955,000
8867024 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing Kafai Lai, Dirk Pfeiffer 2014-10-21 $3,429,000
8769445 Method for determining mask operation activities Emily Gallagher, Jed H. Rankin 2014-07-01 $3,868,000
8719735 Optimizing lithographic mask for manufacturability in efficient manner Masaharu Sakamoto, Marc Alan Szeto-Millstone, Tadanobu Inoue, Kehan Tian, Andreas Waechter +2 more 2014-05-06 $5,370,000
8682634 Analyzing a patterning process using a model of yield Saeed Bagheri, Fook-Luen Heng, Rajiv V. Joshi, Kafai Lai, David O. Melville +3 more 2014-03-25 $4,381,000
8605254 Constrained optimization of lithographic source intensities under contingent requirements Saeed Bagheri, Kafai Lai, David O. S. Melville, Kehan Tian 2013-12-10 $5,756,000
8539390 Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge Tadanobu Inoue, Kehan Tian, David O. Melville, Masaharu Sakamoto 2013-09-17 $4,204,000
8537444 System and method for projection lithography with immersed image-aligned diffractive element Dario Gil, David O. Melville, Kehan Tian, Jaione Tirapu Azpiroz 2013-09-17 $4,204,000
8495528 Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process Saeed Bagheri, Kafai Lai, David O. S. Melville, Kehan Tian, Jaione Tirapu Azpiroz 2013-07-23 $2,085,000
8453076 Wavefront engineering of mask data for semiconductor device design Tadanobu Inoue, David O. Melville, Hidemasa Muta, Kehan Tian, Masaharu Sakamoto +1 more 2013-05-28 $7,454,000