AR

Alan E. Rosenbluth

IBM: 103 patents #529 of 70,183Top 1%
Globalfoundries: 2 patents #1,397 of 4,424Top 35%
UR University Of Rochester: 1 patents #496 of 1,162Top 45%
Overall (All Time): #12,938 of 4,157,543Top 1%
106
Patents All Time

Issued Patents All Time

Showing 25 most recent of 106 patents

Patent #TitleCo-InventorsDate
12039402 Color-map method to eliminate qubit frequency crowding in a quantum computing chip Jared Barney Hertzberg, Dongbing Shao 2024-07-16
10915686 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2021-02-09
10872188 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2020-12-22
10437950 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2019-10-08
10394984 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2019-08-27
10210295 Tool to provide integrated circuit masks with accurate dimensional compensation of patterns 2019-02-19
10120963 Figurative models calibrated to correct errors in process models Pardeep Kumar, Ramana Murthy Pusuluri, Ramya Viswanathan 2018-11-06
9857676 Method and program product for designing source and mask for lithography Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2018-01-02
9651856 Source, target and mask optimization by incorporating contour based assessments and integration over process variations Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2017-05-16
9395622 Synthesizing low mask error enhancement factor lithography solutions Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2016-07-19
9310674 Mask that provides improved focus control using orthogonal edges Jaione Tirapu Azpiroz, Timothy A. Brunner 2016-04-12
9250535 Source, target and mask optimization by incorporating countour based assessments and integration over process variations Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2016-02-02
8959462 Mask design method, program, and mask design system Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2015-02-17
8954898 Source-mask optimization for a lithography process Tadanobu Inoue, David O. Melville, Masaharu Sakamoto, Kehan Tian 2015-02-10
8910089 Printing process calibration and correction Samit Barai 2014-12-09
8880382 Analyzing a patterning process using a model of yield Saeed Bagheri, Fook-Luen Heng, Rajiv V. Joshi, Kafai Lai, David O. Melville +3 more 2014-11-04
8867024 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing Kafai Lai, Dirk Pfeiffer 2014-10-21
8769445 Method for determining mask operation activities Emily Gallagher, Jed H. Rankin 2014-07-01
8719735 Optimizing lithographic mask for manufacturability in efficient manner Masaharu Sakamoto, Marc Alan Szeto-Millstone, Tadanobu Inoue, Kehan Tian, Andreas Waechter +2 more 2014-05-06
8682634 Analyzing a patterning process using a model of yield Saeed Bagheri, Fook-Luen Heng, Rajiv V. Joshi, Kafai Lai, David O. Melville +3 more 2014-03-25
8605254 Constrained optimization of lithographic source intensities under contingent requirements Saeed Bagheri, Kafai Lai, David O. S. Melville, Kehan Tian 2013-12-10
8539390 Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge Tadanobu Inoue, Kehan Tian, David O. Melville, Masaharu Sakamoto 2013-09-17
8537444 System and method for projection lithography with immersed image-aligned diffractive element Dario Gil, David O. Melville, Kehan Tian, Jaione Tirapu Azpiroz 2013-09-17
8495528 Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process Saeed Bagheri, Kafai Lai, David O. S. Melville, Kehan Tian, Jaione Tirapu Azpiroz 2013-07-23
8453076 Wavefront engineering of mask data for semiconductor device design Tadanobu Inoue, David O. Melville, Hidemasa Muta, Kehan Tian, Masaharu Sakamoto +1 more 2013-05-28