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Test pattern layout for test photomask and method for evaluating critical dimension changes |
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| 9989843 |
Test pattern layout for test photomask and method for evaluating critical dimension changes |
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| 9372394 |
Test pattern layout for test photomask and method for evaluating critical dimension changes |
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Method and system for feature function aware priority printing |
Emily Gallagher, Steven C. Nash, Jed H. Rankin |
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Method and system for feature function aware priority printing |
Emily Gallagher, Steven C. Nash, Jed H. Rankin |
2012-07-24 |
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Method of compensating for defective pattern generation data in a variable shaped electron beam system |
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2009-02-24 |
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2007-04-03 |
