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Test pattern layout for test photomask and method for evaluating critical dimension changes |
Brian N. Caldwell, Yuki Fujita, Raymond W. Jeffer, Joseph L. Malenfant, Jr., Steven C. Nash |
2018-06-12 |
| 9989843 |
Test pattern layout for test photomask and method for evaluating critical dimension changes |
Brian N. Caldwell, Yuki Fujita, Raymond W. Jeffer, Joseph L. Malenfant, Jr., Steven C. Nash |
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| 9372394 |
Test pattern layout for test photomask and method for evaluating critical dimension changes |
Brian N. Caldwell, Yuki Fujita, Raymond W. Jeffer, Joseph L. Malenfant, Jr., Steven C. Nash |
2016-06-21 |
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Method to etch chrome for photomask fabrication |
Shaun Crawford, Thomas B. Faure, Cuc K. Huynh |
2010-07-13 |
| 6777137 |
EUVL mask structure and method of formation |
Emily E. Fisch, Louis M. Kindt, Michael R. Schmidt, Carey T. Williams |
2004-08-17 |
| 6426177 |
Single component developer for use with ghost exposure |
Thomas B. Faure, Steven Flanders, Lyndon S. Gibbs, Harold G. Linde, Joseph L. Malenfant, Jr. +1 more |
2002-07-30 |
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Single component developer for copolymer resists |
Thomas B. Faure, Steven Flanders, Harold G. Linde, Jeffrey F. Shepard |
2001-08-07 |
| 5159170 |
Grid structure for reducing current density in focussed ion beam |
Alfred Wagner |
1992-10-27 |
| 5149974 |
Gas delivery for ion beam deposition and etching |
Steven J. Kirch, Alfred Wagner |
1992-09-22 |
| 4388386 |
Mask set mismatch |
Bruce Dale King |
1983-06-14 |
