| 11143953 |
Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 |
Robert L. Sandstrom, Peter H. Bartlau, Supratik Guha, Edward W. Kiewra, Louis M. Kindt +1 more |
2021-10-12 |
$3,967,000 |
| 8568959 |
Techniques for reducing degradation and/or modifying feature size of photomasks |
Peter H. Bartlau, Alfred Wagner |
2013-10-29 |
$6,299,000 |
| 7861208 |
Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks |
Howard S. Landis, Jeanne-Tania Sucharitaves |
2010-12-28 |
$5,922,000 |
| 7754394 |
Method to etch chrome for photomask fabrication |
Shaun Crawford, Cuc K. Huynh, James P. Levin |
2010-07-13 |
$6,420,000 |
| 7709300 |
Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks |
Howard S. Landis, Jeanne-Tania Sucharitaves |
2010-05-04 |
$4,679,000 |
| 7014959 |
CD uniformity of chrome etch to photomask process |
Shaun Crawford, Timothy J. Dalton, Cuc K. Huynh, Michelle L. Steen, Thomas M. Wagner |
2006-03-21 |
$6,971,000 |
| 7014958 |
Method for dry etching photomask material |
Timothy J. Dalton, Michelle L. Steen |
2006-03-21 |
$6,971,000 |
| 6758912 |
Method of inhibiting contaminants using dilute acid rinse |
Virginia Chi-Chuen Chao, Scott A. Estes, Thomas M. Wagner |
2004-07-06 |
$6,814,000 |
| 6494966 |
Method of minimizing contaminating deposits using dilute acid rinse |
Virginia Chi-Chuen Chao, Scott A. Estes, Thomas M. Wagner |
2002-12-17 |
$17,155,000 |
| 6436605 |
Plasma resistant composition and use thereof |
Marie Angelopoulos, Ari Aviram, Edward D. Babich, Timothy A. Brunner, C. Richard Guarnieri +2 more |
2002-08-20 |
$9,830,000 |
| 6426177 |
Single component developer for use with ghost exposure |
Steven Flanders, Lyndon S. Gibbs, James P. Levin, Harold G. Linde, Joseph L. Malenfant, Jr. +1 more |
2002-07-30 |
$10,205,000 |
| 6287434 |
Plating cell apparatus for x-ray mask fabrication |
Robin J. Ackel, Douglas E. Benoit, Michael H. Charland |
2001-09-11 |
|
| 6270949 |
Single component developer for copolymer resists |
Steven Flanders, James P. Levin, Harold G. Linde, Jeffrey F. Shepard |
2001-08-07 |
$22,988,000 |
| 6162565 |
Dilute acid rinse after develop for chrome etch |
Virginia Chi-Chuen Chao, Scott A. Estes, Thomas M. Wagner |
2000-12-19 |
$38,646,000 |
| 6039858 |
Plating process for x-ray mask fabrication |
Robin J. Ackel, Douglas E. Benoit, Michael H. Charland |
2000-03-21 |
$35,798,000 |
| 5783309 |
Recovery of an anodically bonded glass device from a substrate by use of a metal interlayer |
Kurt R. Kimmel, Wilbur D. Pricer, Charles A. Whiting |
1998-07-21 |
$12,143,000 |
| 5538151 |
Recovery of an anodically bonded glass device from a susstrate by use of a metal interlayer |
Kurt R. Kimmel, Wilbur D. Pricer, Charles A. Whiting |
1996-07-23 |
$7,499,000 |
| 5459001 |
Low stress electrodeposition of gold for x-ray mask fabrication |
Scott A. Estes, Steven C. Nash |
1995-10-17 |
$11,855,000 |
| 5409852 |
Method of Manufacturing three dimensional integrated device and circuit structures |
Bernard S. Meyerson, Wilbur D. Pricer, Cecilia C. Smolinski |
1995-04-25 |
$11,120,000 |
| 5318687 |
Low stress electrodeposition of gold for X-ray mask fabrication |
Scott A. Estes, Steven C. Nash |
1994-06-07 |
$8,003,000 |
| 5319240 |
Three dimensional integrated device and circuit structures |
Bernard S. Meyerson, Wilbur D. Pricer, Cecilia C. Smolinski |
1994-06-07 |
$8,003,000 |
| 5160987 |
Three-dimensional semiconductor structures formed from planar layers |
Wilber D. Pricer, Bernard S. Meyerson, William J. Nestork, John R. Turnbull, Jr. |
1992-11-03 |
$14,331,000 |
| 5124561 |
Process for X-ray mask warpage reduction |
Kurt R. Kimmel, James G. Ryan, Timothy D. Sullivan |
1992-06-23 |
$17,034,000 |
