Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143953 | Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 | Robert L. Sandstrom, Peter H. Bartlau, Supratik Guha, Edward W. Kiewra, Louis M. Kindt +1 more | 2021-10-12 |
| 8568959 | Techniques for reducing degradation and/or modifying feature size of photomasks | Peter H. Bartlau, Alfred Wagner | 2013-10-29 |
| 7861208 | Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks | Howard S. Landis, Jeanne-Tania Sucharitaves | 2010-12-28 |
| 7754394 | Method to etch chrome for photomask fabrication | Shaun Crawford, Cuc K. Huynh, James P. Levin | 2010-07-13 |
| 7709300 | Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks | Howard S. Landis, Jeanne-Tania Sucharitaves | 2010-05-04 |
| 7014959 | CD uniformity of chrome etch to photomask process | Shaun Crawford, Timothy J. Dalton, Cuc K. Huynh, Michelle L. Steen, Thomas M. Wagner | 2006-03-21 |
| 7014958 | Method for dry etching photomask material | Timothy J. Dalton, Michelle L. Steen | 2006-03-21 |
| 6758912 | Method of inhibiting contaminants using dilute acid rinse | Virginia Chi-Chuen Chao, Scott A. Estes, Thomas M. Wagner | 2004-07-06 |
| 6494966 | Method of minimizing contaminating deposits using dilute acid rinse | Virginia Chi-Chuen Chao, Scott A. Estes, Thomas M. Wagner | 2002-12-17 |
| 6436605 | Plasma resistant composition and use thereof | Marie Angelopoulos, Ari Aviram, Edward D. Babich, Timothy A. Brunner, C. Richard Guarnieri +2 more | 2002-08-20 |
| 6426177 | Single component developer for use with ghost exposure | Steven Flanders, Lyndon S. Gibbs, James P. Levin, Harold G. Linde, Joseph L. Malenfant, Jr. +1 more | 2002-07-30 |
| 6287434 | Plating cell apparatus for x-ray mask fabrication | Robin J. Ackel, Douglas E. Benoit, Michael H. Charland | 2001-09-11 |
| 6270949 | Single component developer for copolymer resists | Steven Flanders, James P. Levin, Harold G. Linde, Jeffrey F. Shepard | 2001-08-07 |
| 6162565 | Dilute acid rinse after develop for chrome etch | Virginia Chi-Chuen Chao, Scott A. Estes, Thomas M. Wagner | 2000-12-19 |
| 6039858 | Plating process for x-ray mask fabrication | Robin J. Ackel, Douglas E. Benoit, Michael H. Charland | 2000-03-21 |
| 5783309 | Recovery of an anodically bonded glass device from a substrate by use of a metal interlayer | Kurt R. Kimmel, Wilbur D. Pricer, Charles A. Whiting | 1998-07-21 |
| 5538151 | Recovery of an anodically bonded glass device from a susstrate by use of a metal interlayer | Kurt R. Kimmel, Wilbur D. Pricer, Charles A. Whiting | 1996-07-23 |
| 5459001 | Low stress electrodeposition of gold for x-ray mask fabrication | Scott A. Estes, Steven C. Nash | 1995-10-17 |
| 5409852 | Method of Manufacturing three dimensional integrated device and circuit structures | Bernard S. Meyerson, Wilbur D. Pricer, Cecilia C. Smolinski | 1995-04-25 |
| 5318687 | Low stress electrodeposition of gold for X-ray mask fabrication | Scott A. Estes, Steven C. Nash | 1994-06-07 |
| 5319240 | Three dimensional integrated device and circuit structures | Bernard S. Meyerson, Wilbur D. Pricer, Cecilia C. Smolinski | 1994-06-07 |
| 5160987 | Three-dimensional semiconductor structures formed from planar layers | Wilber D. Pricer, Bernard S. Meyerson, William J. Nestork, John R. Turnbull, Jr. | 1992-11-03 |
| 5124561 | Process for X-ray mask warpage reduction | Kurt R. Kimmel, James G. Ryan, Timothy D. Sullivan | 1992-06-23 |