Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143953 | Protection of photomasks from 193nm radiation damage using thin coatings of ALD Al2O3 | Robert L. Sandstrom, Thomas B. Faure, Supratik Guha, Edward W. Kiewra, Louis M. Kindt +1 more | 2021-10-12 |
| 8568959 | Techniques for reducing degradation and/or modifying feature size of photomasks | Thomas B. Faure, Alfred Wagner | 2013-10-29 |
| 6541351 | Method for limiting divot formation in post shallow trench isolation processes | Marc W. Cantell, Jerome B. Lasky, James D. Weil | 2003-04-01 |