Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Low stress electrodeposition of gold for X-ray mask fabrication

Low stress electrodeposition of gold for X-ray mask fabrication

US Patent 5318687 · Granted Jun 7, 1994

Estimated economic value: $8,003,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Protection of photomasks from 193nm radiation damage using thin coatings of ALD 2021
Test pattern layout for test photomask and method for evaluating critical dimens2018
Test pattern layout for test photomask and method for evaluating critical dimens2018
Test pattern layout for test photomask and method for evaluating critical dimens2016
Method and system for feature function aware priority printing2013
Techniques for reducing degradation and/or modifying feature size of photomasks2013
Copper contamination detection method and system for monitoring copper contamina2012
Method and system for feature function aware priority printing2012
Copper contamination detection method and system for monitoring copper contamina2011
Copper contamination detection method and system for monitoring copper contamina2011
Structure for partitioned dummy fill shapes for reduced mask bias with alternati2010
Corrosion inhibitor additives to prevent semiconductor device bond-pad corrosion2010