Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks

Structure for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks

US Patent 7861208 · Granted Dec 28, 2010

Estimated economic value: $5,922,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Protection of photomasks from 193nm radiation damage using thin coatings of ALD 2021
Modifying design layer of integrated circuit (IC) using nested and non-nested fi2019
Modifying design layer of integrated circuit (IC)2018
Trimming of dummy fill shapes holes to affect near-neighbor dummy fill shapes wi2015
Parameter variation improvement2015
Method and system allowing for semiconductor design rule optimization2014
Optimization metallization for prevention of dielectric cracking under controlle2014
Near-neighbor trimming of dummy fill shapes with built-in optical proximity corr2014
Techniques for reducing degradation and/or modifying feature size of photomasks2013
Method of forming a semiconductor device having a cut-way hole to expose a porti2013
Automated generation of oxide pillar slot shapes in silicon-on-insulator formati2013
Methods and systems to meet technology pattern density requirements of semicondu2013