Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Parameter variation improvement

Parameter variation improvement

US Patent 8954901 · Granted Feb 10, 2015

Estimated economic value: $3,717,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Modifying design layer of integrated circuit (IC) using nested and non-nested fi2019
Modifying design layer of integrated circuit (IC)2018
Integrated circuit and design structure having reduced through silicon via-induc2016
Optimization of integrated circuits for a reticle transmission process window us2015
Trimming of dummy fill shapes holes to affect near-neighbor dummy fill shapes wi2015
Optimized optical proximity correction handling for lithographic fills2014
Method and system allowing for semiconductor design rule optimization2014
Optimization metallization for prevention of dielectric cracking under controlle2014
Near-neighbor trimming of dummy fill shapes with built-in optical proximity corr2014
Method of forming a semiconductor device having a cut-way hole to expose a porti2013
Yield enhancement by multiplicate-layer-handling optical correction2013
Methods and systems to meet technology pattern density requirements of semicondu2013