Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for dry etching photomask material

Method for dry etching photomask material

US Patent 7014958 · Granted Mar 21, 2006

Estimated economic value: $6,971,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Protection of photomasks from 193nm radiation damage using thin coatings of ALD 2021
Photovoltaic module with a controllable infrared protection layer2019
Methods and structures for protecting one area while processing another area on 2016
Extended gate sensor for pH sensing2015
Corrugated interfaces for multilayered interconnects2015
Methods and structures for protecting one area while processing another area on 2015
Forming semiconductor chip connections2015
Corrugated interfaces for multilayered interconnects2014
Forming semiconductor chip connections2014
Interconnect structures and design structures for a radiofrequency integrated ci2014
Two-dimensional patterning employing self-assembled material2014
Double-sided integrated circuit chips2014