Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6968288 | Method for detection of photolithographic defocus | Dennis L. Macaluso, Richard A. Phelps | 2005-11-22 |
| 6856378 | Method of photolithographic exposure dose control as a function of resist sensitivity | Keith J. Machia, Matthew Nicholls, Charles J. Parrish, Craig E. Schneider | 2005-02-15 |
| 6735492 | Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings | Edward W. Conrad, John S. Smyth, David A. Ziemer | 2004-05-11 |
| 6694498 | Feed-forward lithographic overlay offset method and system | Edward W. Conrad, Charles J. Parrish | 2004-02-17 |
| 6674516 | Method of photolithographic exposure dose control as a function of resist sensitivity | Keith J. Machia, Matthew Nicholls, Charles J. Parrish, Craig E. Schneider | 2004-01-06 |
| 6606533 | Method and arrangement for controlling image size of integrated circuits on wafers through post-exposure bake hotplate-specific dose feedback | — | 2003-08-12 |
| 6518679 | Capacitive alignment structure and method for chip stacking | Ning Lu, Wilbur D. Pricer | 2003-02-11 |
| 6412666 | Fluid container with a keying means to prevent improper fluid loading in a fluid delivery tool and a system including such fluid container and fluid delivery tool | Dennis P. Hogan, Christopher E. Walsh | 2002-07-02 |
| 6377334 | Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers | — | 2002-04-23 |
| 6342735 | Dual use alignment aid | James J. Colelli, Steven J. Holmes, Peter H. Mitchell, Joseph Mundenar | 2002-01-29 |
| 6278515 | Method and apparatus for adjusting a tilt of a lithography tool | Stephen E. Knight | 2001-08-21 |
| 6235439 | Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers | — | 2001-05-22 |
| 6100506 | Hot plate with in situ surface temperature adjustment | James J. Colelli, Randall A. Leggett, Joseph Mundenar | 2000-08-08 |
| 5783309 | Recovery of an anodically bonded glass device from a substrate by use of a metal interlayer | Thomas B. Faure, Kurt R. Kimmel, Wilbur D. Pricer | 1998-07-21 |
| 5716763 | Liquid immersion heating process for substrate temperature uniformity | Douglas E. Benoit, Harold G. Linde, Denise M. Puisto | 1998-02-10 |
| 5712078 | High contrast photoresists comprising acid sensitive crosslinked polymeric resins | Wu-Song Huang, Harold G. Linde | 1998-01-27 |
| 5538151 | Recovery of an anodically bonded glass device from a susstrate by use of a metal interlayer | Thomas B. Faure, Kurt R. Kimmel, Wilbur D. Pricer | 1996-07-23 |