| 7332054 |
Etch apparatus |
Arne Ballantine, Scott A. Estes, Gary L. Milo, Ronald A. Warren |
2008-02-19 |
| 6777137 |
EUVL mask structure and method of formation |
Louis M. Kindt, James P. Levin, Michael R. Schmidt, Carey T. Williams |
2004-08-17 |
| 6699400 |
Etch process and apparatus therefor |
Arne Ballantine, Scott A. Estes, Gary L. Milo, Ronald A. Warren |
2004-03-02 |
| 6683306 |
Array foreshortening measurement using a critical dimension scanning electron microscope |
Reginald R. Bowley, Jr., Debra L. Meunier |
2004-01-27 |
| 6577406 |
Structure for lithographic focus control features |
James A. Bruce, Orest Bula |
2003-06-10 |
| 6372573 |
Self-aligned trench capacitor capping process for high density DRAM cells |
Masami Aoki, Hirofumi Inoue, Bruce W. Porth, Max G. Levy, Victor R. Nastasi +1 more |
2002-04-16 |
| 6282459 |
Structure and method for detection of physical interference during transport of an article |
Arne Ballantine, Ronald A. Warren |
2001-08-28 |
| 6276370 |
Sonic cleaning with an interference signal |
Glenn W. Gale, Harald Okorn-Schmidt, William A. Syverson |
2001-08-21 |
