| 7492940 |
Mask defect analysis system |
James A. Bruce, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger |
2009-02-17 |
| 7492941 |
Mask defect analysis system |
James A. Bruce, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger |
2009-02-17 |
| 7257247 |
Mask defect analysis system |
James A. Bruce, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger |
2007-08-14 |
| 6704695 |
Interactive optical proximity correction design method |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2004-03-09 |
| 6667136 |
Method to control nested to isolated line printing |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2003-12-23 |
| 6627361 |
Assist features for contact hole mask patterns |
Michael S. Hibbs, Steven J. Holmes, Paul A. Rabidoux |
2003-09-30 |
| 6577406 |
Structure for lithographic focus control features |
James A. Bruce, Emily E. Fisch |
2003-06-10 |
| 6539321 |
Method for edge bias correction of topography-induced linewidth variation |
James A. Bruce, Edward W. Conrad, William C. Leipold |
2003-03-25 |
| 6458493 |
Method to control nested to isolated line printing |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2002-10-01 |
| 6429469 |
Optical Proximity Correction Structures Having Decoupling Capacitors |
Archibald J. Allen, John M. Cohn, Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2002-08-06 |
| 6425112 |
Auto correction of error checked simulated printed images |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2002-07-23 |
| 6395438 |
Method of etch bias proximity correction |
James A. Bruce, Edward W. Conrad, William C. Leipold |
2002-05-28 |
| 6383719 |
Process for enhanced lithographic imaging |
Daniel C. Cole, Edward W. Conrad, Stephen E. Knight, Robert K. Leidy |
2002-05-07 |
| 6373975 |
Error checking of simulated printed images with process window effects included |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2002-04-16 |
| 6268908 |
Micro adjustable illumination aperture |
Daniel C. Cole, Edward W. Conrad, David V. Horak, Jed H. Rankin |
2001-07-31 |
| 6261724 |
Method of modifying a microchip layout data set to generate a predicted mask printed data set |
Daniel C. Cole, Edward W. Conrad, William C. Leipold, Donald J. Samuels |
2001-07-17 |
| 6258490 |
Transmission control mask utilized to reduce foreshortening effects |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2001-07-10 |
| 6238850 |
Method of forming sharp corners in a photoresist layer |
Daniel C. Cole, Edward W. Conrad, William C. Leipold |
2001-05-29 |
| 6214494 |
Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability |
Daniel C. Cole, Edward W. Conrad, Ning Lu |
2001-04-10 |
| 6016357 |
Feedback method to repair phase shift masks |
Timothy E. Neary, Edward W. Conrad |
2000-01-18 |
| 5317573 |
Apparatus and method for real time data error capture and compression redundancy analysis |
Garrett Stephen Koch, Justin A. Woyke, Richard S. Gomez |
1994-05-31 |
| 5093584 |
Self calibrating timing circuit |
Justin A. Woyke, Garrett Stephen Koch, Richard S. Gomez |
1992-03-03 |
