Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7492940 | Mask defect analysis system | James A. Bruce, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2009-02-17 |
| 7492941 | Mask defect analysis system | James A. Bruce, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2009-02-17 |
| 7257247 | Mask defect analysis system | James A. Bruce, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2007-08-14 |
| 6704695 | Interactive optical proximity correction design method | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2004-03-09 |
| 6667136 | Method to control nested to isolated line printing | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2003-12-23 |
| 6627361 | Assist features for contact hole mask patterns | Michael S. Hibbs, Steven J. Holmes, Paul A. Rabidoux | 2003-09-30 |
| 6577406 | Structure for lithographic focus control features | James A. Bruce, Emily E. Fisch | 2003-06-10 |
| 6539321 | Method for edge bias correction of topography-induced linewidth variation | James A. Bruce, Edward W. Conrad, William C. Leipold | 2003-03-25 |
| 6458493 | Method to control nested to isolated line printing | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2002-10-01 |
| 6429469 | Optical Proximity Correction Structures Having Decoupling Capacitors | Archibald J. Allen, John M. Cohn, Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2002-08-06 |
| 6425112 | Auto correction of error checked simulated printed images | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2002-07-23 |
| 6395438 | Method of etch bias proximity correction | James A. Bruce, Edward W. Conrad, William C. Leipold | 2002-05-28 |
| 6383719 | Process for enhanced lithographic imaging | Daniel C. Cole, Edward W. Conrad, Stephen E. Knight, Robert K. Leidy | 2002-05-07 |
| 6373975 | Error checking of simulated printed images with process window effects included | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2002-04-16 |
| 6268908 | Micro adjustable illumination aperture | Daniel C. Cole, Edward W. Conrad, David V. Horak, Jed H. Rankin | 2001-07-31 |
| 6261724 | Method of modifying a microchip layout data set to generate a predicted mask printed data set | Daniel C. Cole, Edward W. Conrad, William C. Leipold, Donald J. Samuels | 2001-07-17 |
| 6258490 | Transmission control mask utilized to reduce foreshortening effects | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2001-07-10 |
| 6238850 | Method of forming sharp corners in a photoresist layer | Daniel C. Cole, Edward W. Conrad, William C. Leipold | 2001-05-29 |
| 6214494 | Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability | Daniel C. Cole, Edward W. Conrad, Ning Lu | 2001-04-10 |
| 6016357 | Feedback method to repair phase shift masks | Timothy E. Neary, Edward W. Conrad | 2000-01-18 |
| 5317573 | Apparatus and method for real time data error capture and compression redundancy analysis | Garrett Stephen Koch, Justin A. Woyke, Richard S. Gomez | 1994-05-31 |
| 5093584 | Self calibrating timing circuit | Justin A. Woyke, Garrett Stephen Koch, Richard S. Gomez | 1992-03-03 |