Issued Patents All Time
Showing 25 most recent of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7176089 | Vertical dual gate field effect transistor | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, James M. Leas +1 more | 2007-02-13 |
| 6815737 | Method for selective trimming of gate structures and apparatus formed thereby | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2004-11-09 |
| 6798017 | Vertical dual gate field effect transistor | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, James M. Leas +1 more | 2004-09-28 |
| 6759315 | Method for selective trimming of gate structures and apparatus formed thereby | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2004-07-06 |
| 6627361 | Assist features for contact hole mask patterns | Orest Bula, Michael S. Hibbs, Steven J. Holmes | 2003-09-30 |
| 6531724 | Borderless gate structures | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2003-03-11 |
| 6440635 | Low “K” factor hybrid photoresist | Steven J. Holmes, Ahmad D. Katnani, Niranjan M. Patel | 2002-08-27 |
| 6440801 | Structure for folded architecture pillar memory cell | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, Howard L. Kalter +2 more | 2002-08-27 |
| 6426175 | Fabrication of a high density long channel DRAM gate with or without a grooved gate | Toshiharu Furukawa, Mark C. Hakey, Stevn J. Holmes, David V. Horak | 2002-07-30 |
| 6387783 | Methods of T-gate fabrication using a hybrid resist | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2002-05-14 |
| 6372412 | Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby | Mark C. Hakey, Steven J. Holmes, David V. Horak, Ahmad D. Katnani, Niranjan M. Patel | 2002-04-16 |
| 6338934 | Hybrid resist based on photo acid/photo base blending | Kuang-Jung Chen, Mark C. Hakey, Steven J. Holmes, Wu-Song Huang | 2002-01-15 |
| 6319651 | Acid sensitive ARC and method of use | Steven J. Holmes | 2001-11-20 |
| 6313492 | Integrated circuit chip produced by using frequency doubling hybrid photoresist | Mark C. Hakey, Steven J. Holmes, David V. Horak, Ahmad D. Katnani, Niranjan M. Patel | 2001-11-06 |
| 6303272 | Process for self-alignment of sub-critical contacts to wiring | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2001-10-16 |
| 6284439 | "Method of producing an integrated circuit chip using low ""k"" factor hybrid photoresist and apparatus formed thereby" | Steven J. Holmes, Ahmad D. Katnani, Niranjan M. Patel | 2001-09-04 |
| 6277543 | Method for forming features using frequency doubling hybrid resist and device formed thereby | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2001-08-21 |
| 6245488 | Method for forming features using frequency doubling hybrid resist and device formed thereby | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2001-06-12 |
| 6221562 | Resist image reversal by means of spun-on-glass | Diane C. Boyd, Toshiharu Furukawa, Steven J. Holmes, William H. Ma, David V. Horak | 2001-04-24 |
| 6221704 | Process for fabricating short channel field effect transistor with a highly conductive gate | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, James S. Nakos | 2001-04-24 |
| 6210866 | Method for forming features using self-trimming by selective etch and device formed thereby | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2001-04-03 |
| 6207514 | Method for forming borderless gate structures and apparatus formed thereby | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2001-03-27 |
| 6200726 | Optimization of space width for hybrid photoresist | Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Ahmad D. Katnani | 2001-03-13 |
| 6194268 | Printing sublithographic images using a shadow mandrel and off-axis exposure | Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak | 2001-02-27 |
| 6190829 | "Low ""K"" factor hybrid photoresist" | Steve Holmes, Ahmad D. Katnani, Niranjan M. Patel | 2001-02-20 |