Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8815475 | Reticle carrier | Kevin S. Petrarca, Donald F. Canaperi, Mahadevaiyer Krishnan, Rebecca D. Mih, Steven E. Steen +1 more | 2014-08-26 |
| 8439728 | Reticle carrier | Kevin S. Petrarca, Donald F. Canaperi, Mahadevaiyer Krishnan, Rebecca D. Mih, Steven E. Steen +1 more | 2013-05-14 |
| 8271910 | EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer | Jaione Tirapu-Azpiroz, Timothy A. Brunner, Alan E. Rosenbluth | 2012-09-18 |
| 8110321 | Method of manufacture of damascene reticle | Kevin S. Petrarca, Donald F. Canaperi, Mahadevaiyer Krishnan, Rebecca D. Mih, Steven E. Steen +1 more | 2012-02-07 |
| 7742632 | Alternating phase shift mask inspection using biased inspection data | Karen D. Badger, Christopher K. Magg | 2010-06-22 |
| 7642016 | Phase calibration for attenuating phase-shift masks | Timothy A. Brunner | 2010-01-05 |
| 7492940 | Mask defect analysis system | James A. Bruce, Orest Bula, Edward W. Conrad, William C. Leipold, Joshua J. Krueger | 2009-02-17 |
| 7492941 | Mask defect analysis system | James A. Bruce, Orest Bula, Edward W. Conrad, William C. Leipold, Joshua J. Krueger | 2009-02-17 |
| 7416820 | Pellicle film optimized for immersion lithography systems with NA>1 | Timothy A. Brunner | 2008-08-26 |
| 7257247 | Mask defect analysis system | James A. Bruce, Orest Bula, Edward W. Conrad, William C. Leipold, Joshua J. Krueger | 2007-08-14 |
| 7239376 | Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices | Max G. Levy, Kenneth Racette | 2007-07-03 |
| 7134933 | Wafer thickness control during backside grind | Donald W. Brouillette, Thomas G. Ference, Harold G. Linde, Ronald L. Mendelson | 2006-11-14 |
| 7060403 | In-situ pellicle monitor | — | 2006-06-13 |
| 7061590 | Pellicle distortion reduction | — | 2006-06-13 |
| 6979518 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Robert N. Lang, Arpan Mahorowala +1 more | 2005-12-27 |
| 6950183 | Apparatus and method for inspection of photolithographic mask | Timothy A. Brunner, Christopher J. Progler | 2005-09-27 |
| 6887126 | Wafer thickness control during backside grind | Donald W. Brouillette, Thomas G. Ference, Harold G. Linde, Ronald L. Mendelson | 2005-05-03 |
| 6858357 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, Cameron Brooks, S. Jay Chey, C. Richard Guarnieri +1 more | 2005-02-22 |
| 6835502 | In-situ pellicle monitor | — | 2004-12-28 |
| 6834548 | Method and apparatus for reduction of high-frequency vibrations in thick pellicles | — | 2004-12-28 |
| 6824932 | Self-aligned alternating phase shift mask patterning process | Scott Bukofsky, Carlos A. Fonseca, Lars Liebmann | 2004-11-30 |
| 6731378 | Pellicle distortion reduction | — | 2004-05-04 |
| 6730445 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Robert N. Lang, Arpan Mahorowala +1 more | 2004-05-04 |
| 6682860 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Robert N. Lang, Arpan Mahorowala +1 more | 2004-01-27 |
| 6653027 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, Cameron Brooks, S. Jay Chey, C. Richard Guarnieri +1 more | 2003-11-25 |