Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7475380 | Generating mask patterns for alternating phase-shift mask lithography | Lars Liebmann, Ioana Graur | 2009-01-06 |
| 7413833 | Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask | Shahid Butt, Ramachandra Divakaruni, Carl Radens, Wayne F. Ellis | 2008-08-19 |
| 7354779 | Topography compensated film application methods | Colin J. Brodsky, Allen H. Gabor | 2008-04-08 |
| 7239371 | Density-aware dynamic leveling in scanning exposure systems | Bernhard R. Liegl, Colin J. Brodsky, Steven J. Holmes | 2007-07-03 |
| 7229936 | Method to reduce photoresist pattern collapse by controlled surface microroughening | Colin J. Brodsky, Dario L. Goldfarb, Scott D. Halle | 2007-06-12 |
| 7171034 | Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography | Qiang Wu | 2007-01-30 |
| 7135255 | Layout impact reduction with angled phase shapes | John K. DeBrosse, Marco Hug, Lars Liebmann, Daniel J. Nickel, Juergen Preuninger | 2006-11-14 |
| 6993741 | Generating mask patterns for alternating phase-shift mask lithography | Lars Liebmann, Ioana Graur | 2006-01-31 |
| 6891169 | Electron beam array write head system and method | Bomy Chen, Sara Jennifer Eames, Qiang Wu | 2005-05-10 |
| 6824932 | Self-aligned alternating phase shift mask patterning process | Carlos A. Fonseca, Michael S. Hibbs, Lars Liebmann | 2004-11-30 |
| 6777147 | Method for evaluating the effects of multiple exposure processes in lithography | Carlos A. Fonseca, Kafai Lai | 2004-08-17 |
| 6566030 | Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores | Robert D. Grober, Paul Dentinger, James Welch Taylor | 2003-05-20 |
| 6563566 | System and method for printing semiconductor patterns using an optimized illumination and reticle | Alan E. Rosenbluth, Alfred Wong | 2003-05-13 |
| 6511791 | Multiple exposure process for formation of dense rectangular arrays | Gerhard Kunkel, Richard J. Wise, Alfred Wong | 2003-01-28 |
| 6451508 | Plural interleaved exposure process for increased feature aspect ratio in dense arrays | Gerhard Kunkel, Alan C. Thomas | 2002-09-17 |
| 6451490 | Method to overcome image shortening by use of sub-resolution reticle features | William H. Advocate, Christopher Adam Feild, Donald J. Samuels | 2002-09-17 |
| 6376149 | Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores | Robert D. Grober, Paul Dentinger, James Welch Taylor | 2002-04-23 |
| 6327023 | Optimization of reticle rotation for critical dimension and overlay improvement | Christopher J. Progler | 2001-12-04 |