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Generating mask patterns for alternating phase-shift mask lithography |
Lars Liebmann, Ioana Graur |
2009-01-06 |
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Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask |
Shahid Butt, Ramachandra Divakaruni, Carl Radens, Wayne F. Ellis |
2008-08-19 |
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Topography compensated film application methods |
Colin J. Brodsky, Allen H. Gabor |
2008-04-08 |
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Density-aware dynamic leveling in scanning exposure systems |
Bernhard R. Liegl, Colin J. Brodsky, Steven J. Holmes |
2007-07-03 |
| 7229936 |
Method to reduce photoresist pattern collapse by controlled surface microroughening |
Colin J. Brodsky, Dario L. Goldfarb, Scott D. Halle |
2007-06-12 |
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Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithography |
Qiang Wu |
2007-01-30 |
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Layout impact reduction with angled phase shapes |
John K. DeBrosse, Marco Hug, Lars Liebmann, Daniel J. Nickel, Juergen Preuninger |
2006-11-14 |
| 6993741 |
Generating mask patterns for alternating phase-shift mask lithography |
Lars Liebmann, Ioana Graur |
2006-01-31 |
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Electron beam array write head system and method |
Bomy Chen, Sara Jennifer Eames, Qiang Wu |
2005-05-10 |
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Self-aligned alternating phase shift mask patterning process |
Carlos A. Fonseca, Michael S. Hibbs, Lars Liebmann |
2004-11-30 |
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Method for evaluating the effects of multiple exposure processes in lithography |
Carlos A. Fonseca, Kafai Lai |
2004-08-17 |
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Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores |
Robert D. Grober, Paul Dentinger, James Welch Taylor |
2003-05-20 |
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System and method for printing semiconductor patterns using an optimized illumination and reticle |
Alan E. Rosenbluth, Alfred Wong |
2003-05-13 |
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Multiple exposure process for formation of dense rectangular arrays |
Gerhard Kunkel, Richard J. Wise, Alfred Wong |
2003-01-28 |
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Plural interleaved exposure process for increased feature aspect ratio in dense arrays |
Gerhard Kunkel, Alan C. Thomas |
2002-09-17 |
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William H. Advocate, Christopher Adam Feild, Donald J. Samuels |
2002-09-17 |
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Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores |
Robert D. Grober, Paul Dentinger, James Welch Taylor |
2002-04-23 |
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Optimization of reticle rotation for critical dimension and overlay improvement |
Christopher J. Progler |
2001-12-04 |
