Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9576098 | Lithography aware leakage analysis | Emre Tuncer, Hui Zheng, Vivek Raghavan, Anirudh Devgan, Amir Ajami +3 more | 2017-02-21 |
| 9196244 | Methodology for enhanced voice search experience | Leor Doron | 2015-11-24 |
| 8572523 | Lithography aware leakage analysis | Emre Tuncer, Hui Zheng, Vivek Raghavan, Anirudh Devgan, Amir Ajami +3 more | 2013-10-29 |
| 8473876 | Lithography aware timing analysis | Emre Tuncer, Hui Zheng, Vivek Raghavan, Anirudh Devgan, Amir Ajami +3 more | 2013-06-25 |
| 7932020 | Contact or proximity printing using a magnified mask image | Christophe Pierrat | 2011-04-26 |
| 7614033 | Mask data preparation | Christophe Pierrat | 2009-11-03 |
| 7569308 | Rectangular contact lithography for circuit performance improvement and manufacture cost reduction | Jun Wang, Edmund Y. Lam | 2009-08-04 |
| 7441174 | Embedded state metric storage for MAP decoder of turbo codes | Victor On-Kwok Li, Jianhao Hu | 2008-10-21 |
| 7434188 | Lithographically optimized placement tool | Anirudh Devgan, Roderick Metcalfe, Vivek Raghavan | 2008-10-07 |
| 7155689 | Design-manufacturing interface via a unified model | Christophe Pierrat | 2006-12-26 |
| 7055127 | Mask data preparation | Christophe Pierrat | 2006-05-30 |
| 7009490 | Efficient lock and key system | Edward S. Yang | 2006-03-07 |
| 6961186 | Contact printing using a magnified mask image | Christophe Pierrat | 2005-11-01 |
| 6871316 | Delay reduction of hardware implementation of the maximum a posteriori (MAP) method | Cheng Qian | 2005-03-22 |
| 6602728 | Method for generating a proximity model based on proximity rules | Lars Liebmann, Scott M. Mansfield | 2003-08-05 |
| 6596442 | Asymmetric halftone biasing for sub-grid pattern adjustment | Richard A. Ferguson, Lars Liebmann | 2003-07-22 |
| 6578190 | Process window based optical proximity correction of lithographic images | Richard A. Ferguson, Mark A. Lavin, Lars Liebmann | 2003-06-10 |
| 6563566 | System and method for printing semiconductor patterns using an optimized illumination and reticle | Alan E. Rosenbluth, Scott Bukofsky | 2003-05-13 |
| 6553559 | Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions | Lars Liebmann, Scott M. Mansfield | 2003-04-22 |
| 6541166 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Scott M. Mansfield, Timothy A. Brunner, James A. Culp | 2003-04-01 |
| 6525818 | Overlay alignment system using polarization schemes | Xiaoming Yin, Tim Wiltshire, Don Wheeler | 2003-02-25 |
| 6526164 | Intelligent photomask disposition | Scott M. Mansfield | 2003-02-25 |
| 6511791 | Multiple exposure process for formation of dense rectangular arrays | Scott Bukofsky, Gerhard Kunkel, Richard J. Wise | 2003-01-28 |
| 6338922 | Optimized alternating phase shifted mask design | Lars Liebmann | 2002-01-15 |
| 6327033 | Detection of phase defects on photomasks by differential imaging | Richard A. Ferguson | 2001-12-04 |