| 7147976 |
Binary OPC for assist feature layout optimization |
Lars Liebmann, Allen H. Gabor, Mark A. Lavin |
2006-12-12 |
| 7001693 |
Binary OPC for assist feature layout optimization |
Lars Liebmann, Allen H. Gabor, Mark A. Lavin |
2006-02-21 |
| 6596442 |
Asymmetric halftone biasing for sub-grid pattern adjustment |
Alfred Wong, Lars Liebmann |
2003-07-22 |
| 6578190 |
Process window based optical proximity correction of lithographic images |
Mark A. Lavin, Lars Liebmann, Alfred Wong |
2003-06-10 |
| 6327033 |
Detection of phase defects on photomasks by differential imaging |
Alfred Wong |
2001-12-04 |
| 6223139 |
Kernel-based fast aerial image computation for a large scale design of integrated circuit patterns |
Alfred Wong |
2001-04-24 |
| 6184151 |
Method for forming cornered images on a substrate and photomask formed thereby |
William J. Adair, Mark C. Hakey, Steven J. Holmes, David V. Horak, Robert K. Leidy +3 more |
2001-02-06 |
| 5965306 |
Method of determining the printability of photomask defects |
Scott M. Mansfield, Alfred Wong |
1999-10-12 |
| 5959325 |
Method for forming cornered images on a substrate and photomask formed thereby |
William J. Adair, Mark C. Hakey, Steven J. Holmes, David V. Horak, Robert K. Leidy +3 more |
1999-09-28 |
| 5936738 |
Focus monitor for alternating phase shifted masks |
Lars Liebmann |
1999-08-10 |
| 5932377 |
Exact transmission balanced alternating phase-shifting mask for photolithography |
Lars Liebmann, Scott M. Mansfield, David S. O'Grady, Alfred Wong |
1999-08-03 |
| 5807649 |
Lithographic patterning method and mask set therefor with light field trim mask |
Lars Liebmann, David S. O'Grady, William J. Adair |
1998-09-15 |
| 5538833 |
High resolution phase edge lithography without the need for a trim mask |
Lars Liebmann, Ronald M. Martino, Thomas H. Newman |
1996-07-23 |
