Issued Patents All Time
Showing 25 most recent of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10516767 | Unifying realtime and static data for presenting over a web service | Amith Singhee, Steven N. Hirsch, Ashok Pon Kumar Sree Prakash, Ulrich A. Finkler, David O. S. Melville | 2019-12-24 |
| 9910348 | Method of simultaneous lithography and etch correction flow | Geng Han, Dominique Nguyen-Ngoc, Donald J. Samuels, Ramya Viswanathan | 2018-03-06 |
| 9471743 | Predicting process fail limits | Geng Han, Ramya Viswanathan | 2016-10-18 |
| 9252022 | Patterning assist feature to mitigate reactive ion etch microloading effect | Daniel James Dechene, Geng Han, Stuart A. Sieg, Yunpeng Yin | 2016-02-02 |
| 9087739 | Pattern improvement in multiprocess patterning | Derren N. Dunn, Ioana Graur | 2015-07-21 |
| 9034562 | Pattern improvement in multiprocess patterning | Derren N. Dunn, Ioana Graur | 2015-05-19 |
| 8392871 | Decomposition with multiple exposures in a process window based OPC flow using tolerance bands | Geng Han, Ioana Graur | 2013-03-05 |
| 8365108 | Generating cut mask for double-patterning process | Zachary Baum, Henning Haffner | 2013-01-29 |
| 8214770 | Multilayer OPC for design aware manufacturing | Maharaj Mukherjee, James A. Culp, Lars Liebmann | 2012-07-03 |
| 8174681 | Calibration of lithographic process models | Ioana Graur, Geng Han, Michael E. Scaman | 2012-05-08 |
| 8166423 | Photomask design verification | James A. Bruce, Gregory J. Dick, Ioana Graur | 2012-04-24 |
| 8161422 | Fast and accurate method to simulate intermediate range flare effects | Maharaj Mukherjee, James A. Culp, Kafai Lai, Alan E. Rosenbluth | 2012-04-17 |
| 8108804 | Short path customized mask correction | Ioana Graur | 2012-01-31 |
| 8039203 | Integrated circuits and methods of design and manufacture thereof | Helen Wang, Scott D. Halle, Henning Haffner, Haoren Zhuang, Klaus Herold +4 more | 2011-10-18 |
| 7945869 | Mask and method for patterning a semiconductor wafer | Henning Haffner | 2011-05-17 |
| 7895547 | Test pattern based process model calibration | Geng Han, Jason E. Meiring, Dario Gil | 2011-02-22 |
| 7765021 | Method to check model accuracy during wafer patterning simulation | Lars Liebmann, Mohamed Talbi | 2010-07-27 |
| 7650587 | Local coloring for hierarchical OPC | Zachary Baum, Ioana Graur, Lars Liebmann | 2010-01-19 |
| 7642020 | Method for separating optical and resist effects in process models | Geng Han | 2010-01-05 |
| 7607114 | Designer's intent tolerance bands for proximity correction and checking | Lars Liebmann, Azalia Krasnoperova, Ioana Graur | 2009-10-20 |
| 7565633 | Verifying mask layout printability using simulation with adjustable accuracy | Maharaj Mukherjee, James A. Culp | 2009-07-21 |
| 7503028 | Multilayer OPC for design aware manufacturing | Maharaj Mukherjee, James A. Culp, Lars Liebmann | 2009-03-10 |
| 7350183 | Method for improving optical proximity correction | Yuping Cui | 2008-03-25 |
| 7343582 | Optical proximity correction using progressively smoothed mask shapes | Maharaj Mukherjee, Alan E. Rosenbluth, Kafai Lai | 2008-03-11 |
| 7266798 | Designer's intent tolerance bands for proximity correction and checking | Lars Liebmann, Azalia Krasnoperova, Ioana Graur | 2007-09-04 |