| 11568101 |
Predictive multi-stage modelling for complex process control |
Scott D. Halle, Kyong Min Yeo, Robin Hsin Kuo Chao |
2023-01-31 |
| 11288429 |
Electrical mask validation |
Daniel A. Corliss, Michael A. Guillorn, Shawn P. Fetterolf |
2022-03-29 |
| 10990747 |
Automatic generation of via patterns with coordinate-based recurrent neural network (RNN) |
Jing Sha, Michael A. Guillorn |
2021-04-27 |
| 10921715 |
Semiconductor structure for optical validation |
Daniel A. Corliss, Michael A. Guillorn, Shawn P. Fetterolf |
2021-02-16 |
| 10768532 |
Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing |
Jing Sha, Ekmini Anuja De Silva, Nelson Felix |
2020-09-08 |
| 10725454 |
Mask process aware calibration using mask pattern fidelity inspections |
Ravi K. Bonam, Nicole Saulnier, Michael M. Crouse |
2020-07-28 |
| 10706200 |
Generative adversarial networks for generating physical design layout patterns of integrated multi-layers |
Jing Sha, Michael A. Guillorn, Martin Burkhardt |
2020-07-07 |
| 10699055 |
Generative adversarial networks for generating physical design layout patterns |
Jing Sha, Michael A. Guillorn, Martin Burkhardt |
2020-06-30 |
| 10678971 |
Space exploration with Bayesian inference |
Jing Sha, Dongbing Shao |
2020-06-09 |
| 10657420 |
Modeling post-lithography stochastic critical dimension variation with multi-task neural networks |
Jing Sha, Ekmini Anuja De Silva |
2020-05-19 |
| 10650111 |
Electrical mask validation |
Daniel A. Corliss, Michael A. Guillorn, Shawn P. Fetterolf |
2020-05-12 |
| 10621301 |
Coordinates-based variational autoencoder for generating synthetic via layout patterns |
Jing Sha, Michael A. Guillorn |
2020-04-14 |
| 10606975 |
Coordinates-based generative adversarial networks for generating synthetic physical design layout patterns |
Jing Sha, Michael A. Guillorn |
2020-03-31 |
| 10599807 |
Automatic generation of via patterns with coordinate-based recurrent neural network (RNN) |
Jing Sha, Michael A. Guillorn |
2020-03-24 |
| 10592635 |
Generating synthetic layout patterns by feedforward neural network based variational autoencoders |
Jing Sha, Michael A. Guillorn |
2020-03-17 |
| 10579764 |
Co-modeling post-lithography critical dimensions and post-etch critical dimensions with multi-task neural networks |
Jing Sha, Ekmini Anuja De Silva |
2020-03-03 |
| 10429743 |
Optical mask validation |
Daniel A. Corliss, Michael A. Guillorn, Shawn P. Fetterolf |
2019-10-01 |
| 9087739 |
Pattern improvement in multiprocess patterning |
Ioana Graur, Scott M. Mansfield |
2015-07-21 |
| 9034562 |
Pattern improvement in multiprocess patterning |
Ioana Graur, Scott M. Mansfield |
2015-05-19 |
| 7975246 |
MEEF reduction by elongation of square shapes |
Michael M. Crouse, Henning Haffner, Michael E. Scaman |
2011-07-05 |
| 7402532 |
Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layer |
Lawrence A. Clevenger, Stefanie Chiras, Timothy J. Dalton, James J. Demarest, Chester T. Dziobkowski +7 more |
2008-07-22 |
| 7211507 |
PE-ALD of TaN diffusion barrier region on low-k materials |
Hyungjun Kim, Stephen M. Rossnagel, Soon-Cheon Seo |
2007-05-01 |
| 7102232 |
Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layer |
Lawrence A. Clevenger, Stefanie Chiras, Timothy J. Dalton, James J. Demarest, Chester T. Dziobkowski +7 more |
2006-09-05 |
