Issued Patents All Time
Showing 25 most recent of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10386714 | Creating knowledge base for optical proximity correction to reduce sub-resolution assist feature printing | Kriteshwar K. Kohli, Mark N. Jobes | 2019-08-20 |
| 10210292 | Process-metrology reproducibility bands for lithographic photomasks | Todd C. Bailey, Scott D. Halle, Marshal A. Miller | 2019-02-19 |
| 10042973 | Expansion of allowed design rule space by waiving benign geometries | Dmitry Vengertsev | 2018-08-07 |
| 9928316 | Process-metrology reproducibility bands for lithographic photomasks | Todd C. Bailey, Scott D. Halle, Marshal A. Miller | 2018-03-27 |
| 9904757 | Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs) | Amr Y. Abdo | 2018-02-27 |
| 9690898 | Generative learning for realistic and ground rule clean hot spot synthesis | Ian P. Stobert, Dmitry Vengertsev | 2017-06-27 |
| 9330225 | Photomask error correction | Aditya Chaudhary, Kalpesh G. Dave, Mini M. Ghosal, Bhavani P. Kumar | 2016-05-03 |
| 9087739 | Pattern improvement in multiprocess patterning | Derren N. Dunn, Scott M. Mansfield | 2015-07-21 |
| 9034562 | Pattern improvement in multiprocess patterning | Derren N. Dunn, Scott M. Mansfield | 2015-05-19 |
| 8392871 | Decomposition with multiple exposures in a process window based OPC flow using tolerance bands | Scott M. Mansfield, Geng Han | 2013-03-05 |
| 8174681 | Calibration of lithographic process models | Geng Han, Scott M. Mansfield, Michael E. Scaman | 2012-05-08 |
| 8166423 | Photomask design verification | Scott M. Mansfield, James A. Bruce, Gregory J. Dick | 2012-04-24 |
| 8108804 | Short path customized mask correction | Scott M. Mansfield | 2012-01-31 |
| 8078995 | Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations | Jaione Tirapu Azpiroz, Alan E. Rosenbluth | 2011-12-13 |
| 8059884 | Method and system for obtaining bounds on process parameters for OPC-verification | Maharaj Mukherjee, Alan E. Rosenbluth | 2011-11-15 |
| 7860701 | Methodology for image fidelity verification | Kafai Lai, Rama N. Singh | 2010-12-28 |
| 7687207 | System for coloring a partially colored design in an alternating phase shift mask | Young Ouk Kim, Mark A. Lavin, Lars Liebmann | 2010-03-30 |
| 7650587 | Local coloring for hierarchical OPC | Zachary Baum, Lars Liebmann, Scott M. Mansfield | 2010-01-19 |
| 7624369 | Closed-loop design for manufacturability process | Geng Han, Scott M. Mansfiled, Lars Liebmann | 2009-11-24 |
| 7607114 | Designer's intent tolerance bands for proximity correction and checking | Scott M. Mansfield, Lars Liebmann, Azalia Krasnoperova | 2009-10-20 |
| 7475380 | Generating mask patterns for alternating phase-shift mask lithography | Lars Liebmann, Scott Bukofsky | 2009-01-06 |
| 7378195 | System for coloring a partially colored design in an alternating phase shift mask | Young Ouk Kim, Mark A. Lavin, Lars Liebmann | 2008-05-27 |
| 7305334 | Methodology for image fidelity verification | Kafai Lai, Rama N. Singh | 2007-12-04 |
| 7266798 | Designer's intent tolerance bands for proximity correction and checking | Scott M. Mansfield, Lars Liebmann, Azalia Krasnoperova | 2007-09-04 |
| 7175942 | Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks | Lars Liebmann | 2007-02-13 |