Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10210292 | Process-metrology reproducibility bands for lithographic photomasks | Ioana Graur, Scott D. Halle, Marshal A. Miller | 2019-02-19 |
| 9928316 | Process-metrology reproducibility bands for lithographic photomasks | Ioana Graur, Scott D. Halle, Marshal A. Miller | 2018-03-27 |
| 9223202 | Method of automatic fluid dispensing for imprint lithography processes | Byung-Jin Choi, Sidlgata V. Sreenivasan, Carlton G. Willson, Mattherw E. Colburn, John Ekerdt | 2015-12-29 |
| 8514374 | Alignment method for semiconductor processing | William Chu, William A. Muth | 2013-08-20 |
| 8491984 | Structure resulting from chemical shrink process over BARC (bottom anti-reflective coating) | Colin J. Brodsky, Allen H. Gabor | 2013-07-23 |
| 8495527 | Pattern recognition with edge correction for design based metrology | Daniel S. Fischer, Dongbing Shao | 2013-07-23 |
| 8429570 | Pattern recognition with edge correction for design based metrology | Daniel S. Fischer, Dongbing Shao | 2013-04-23 |
| 8415212 | Method of enhancing photoresist adhesion to rare earth oxides | James K. Schaeffer, Eric D. Luckowski, Amy L. Child, Daniel Jaeger, Renee T. Mo +1 more | 2013-04-09 |
| 8359562 | System and method for semiconductor device fabrication using modeling | Chandrasekhar Sarma | 2013-01-22 |
| 8330937 | Stray light feedback for dose control in semiconductor lithography systems | Sajan Marokkey, Wai-Kin Li | 2012-12-11 |
| 8110496 | Method for performing chemical shrink process over BARC (bottom anti-reflective coating) | Colin J. Brodsky, Allen H. Gabor | 2012-02-07 |
| 8033814 | Device for holding a template for use in imprint lithography | Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, Carlton G. Willson, John Ekerdt | 2011-10-11 |
| 7998871 | Mask forming and implanting methods using implant stopping layer | Katherina Babich, Richard A. Conti, Ryan P. Deschner | 2011-08-16 |
| 7926006 | Variable fill and cheese for mitigation of BEOL topography | Ryan P. Deschner, Wai-Kin Li, Roger A. Quon | 2011-04-12 |
| 7708542 | Device for holding a template for use in imprint lithography | Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, Carlton G. Willson, John Ekerdt | 2010-05-04 |
| 7651947 | Mask forming and implanting methods using implant stopping layer and mask so formed | Katherina Babich, Richard A. Conti, Ryan P. Deschner | 2010-01-26 |
| 7583362 | Stray light feedback for dose control in semiconductor lithography systems | Sajan Marokkey, Wai-Kin Li | 2009-09-01 |
| 7514356 | Ribs for line collapse prevention in damascene structures | Sajan Marokkey, O Seo Park, Wai-Kin Li | 2009-04-07 |
| 7303383 | Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks | Sidlgata V. Sreenivasan, Byung-Jin Choi, Matthew E. Colburn | 2007-12-04 |
| 7288478 | Method for performing chemical shrink process over BARC (bottom anti-reflective coating) | Colin J. Brodsky, Allen H. Gabor | 2007-10-30 |
| 7229273 | Imprint lithography template having a feature size under 250 nm | Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, Carlton G. Willson, John Ekerdt | 2007-06-12 |
| 7186483 | Method of determining alignment of a template and a substrate having a liquid disposed therebetween | Sidlgata V. Sreenivasan, Byung-Jin Choi, Matthew E. Colburn | 2007-03-06 |
| 7083898 | Method for performing chemical shrink process over BARC (bottom anti-reflective coating) | Colin J. Brodsky, Allen H. Gabor | 2006-08-01 |
| 7060324 | Method of creating a dispersion of a liquid on a substrate | Byung-Jin Choi, Matthew E. Colburn, Sidlgata V. Sreenivasan, C. Grant Willson, John Ekerdt | 2006-06-13 |
| 6986975 | Method of aligning a template with a substrate employing moire patterns | Sidlgata V. Sreenivasan, Byung-Jin Choi, Matthew E. Colburn | 2006-01-17 |