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Transistors and semiconductor devices with oxygen-diffusion barrier layers |
Murshed Chowdhury |
2014-10-07 |
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Scavenging metal stack for a high-K gate dielectric |
Takashi Ando, Unoh Kwon, Vijay Narayanan |
2014-05-27 |
| 8716088 |
Scavenging metal stack for a high-K gate dielectric |
Takashi Ando, Unoh Kwon, Vijay Narayanan |
2014-05-06 |
| 8415212 |
Method of enhancing photoresist adhesion to rare earth oxides |
Eric D. Luckowski, Todd C. Bailey, Amy L. Child, Daniel Jaeger, Renee T. Mo +1 more |
2013-04-09 |
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CMOS integration with metal gate and doped high-K oxides |
Eric D. Luckowski |
2012-11-13 |
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Semiconductor device with oxygen-diffusion barrier layer and method for fabricating same |
Murshed Chowdhury |
2012-02-14 |
| 7910442 |
Process for making a semiconductor device using partial etching |
William J. Taylor, Jr., Cristiano Capasso, Srikanth B. Samavedam |
2011-03-22 |
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Michael P. Belyansky, Siddarth A. Krishnan, Unoh Kwon, Naim Moumen, Ravikumar Ramachandran +3 more |
2010-04-06 |
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Semiconductor device having a metal carbide gate with an electropositive element and a method of making the same |
Srikanth B. Samavedam, David C. Gilmer, Mark V. Raymond |
2010-03-23 |
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Method for forming a dual metal gate structure |
Gauri Karve, Cristiano Capasso, Srikanth B. Samavedam, William J. Taylor, Jr. |
2010-02-23 |
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Method of making metal gate transistors |
David C. Gilmer, Mark V. Raymond, Philip J. Tobin, Srikanth B. Samavedam |
2010-02-02 |
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Semiconductor device with integrated resistive element and method of making |
Byoung W. Min, David C. Sing |
2010-01-19 |
| 7445976 |
Method of forming a semiconductor device having an interlayer and structure therefor |
Rama I. Hegde, Srikanth B. Samavedam |
2008-11-04 |
| 7445981 |
Method for forming a dual metal gate structure |
Gauri Karve, Cristiano Capasso, Srikanth B. Samavedam, William J. Taylor, Jr. |
2008-11-04 |
| 7303983 |
ALD gate electrode |
Dina H. Triyoso, Olubunmi O. Adetutu |
2007-12-04 |
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Method for treating a semiconductor surface to form a metal-containing layer |
Darrell Roan, Dina H. Triyoso, Olubunmi O. Adetutu |
2006-11-07 |
| 7109079 |
Metal gate transistor CMOS process and method for making |
Olubunmi O. Adetutu |
2006-09-19 |
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Method for forming a layer using a purging gas in a semiconductor process |
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2006-03-21 |
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Method to reduce impurity elements during semiconductor film deposition |
Olubunmi O. Adetutu, Dina H. Triyoso |
2006-01-17 |
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Method for forming a semiconductor device structure a semiconductor layer |
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2005-09-27 |
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Process for forming a metal oxy-nitride dielectric layer by varying the flow rate of nitrogen into the chamber |
Mark V. Raymond, Bich-Yen Nguyen |
2004-06-01 |
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Semiconductor structure and process for forming a metal oxy-nitride dielectric layer |
Mark V. Raymond, Bich-Yen Nguyen |
2003-06-10 |
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High K dielectric film |
Vidya Kaushik, Bich-Yen Nguyen, Srinivas V. Pietambaram |
2003-04-01 |
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Apparatus and method for integrated pavement marking |
Roger D. Randall, John L. Edwards, Brian D. Huffman, Jack Crosby, Paul Svaldi |
2001-04-10 |
