Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10763115 | Substrate treatment method for semiconductor device fabrication | — | 2020-09-01 |
| 10367071 | Method and structure for a large-grain high-k dielectric | — | 2019-07-30 |
| 10217698 | Die attachment for packaged semiconductor device | Akhilesh Kumar Singh, Nishant Lakhera | 2019-02-26 |
| 10147697 | Bond pad structure for semiconductor device packaging | Varughese Mathew | 2018-12-04 |
| 10121652 | Formation of metal oxide layer | — | 2018-11-06 |
| 9590063 | Method and structure for a large-grain high-K dielectric | — | 2017-03-07 |
| 9559077 | Die attachment for packaged semiconductor device | Akhilesh Kumar Singh, Nishant Lakhera | 2017-01-31 |
| 9343422 | Structure for aluminum pad metal under ball bond | — | 2016-05-17 |
| 9337164 | Coating layer for a conductive structure | — | 2016-05-10 |
| 9076783 | Methods and systems for selectively forming metal layers on lead frames after die attachment | — | 2015-07-07 |
| 8921176 | Modified high-K gate dielectric stack | — | 2014-12-30 |
| 8637393 | Methods and structures for capping a structure with a protective coating | — | 2014-01-28 |
| 8440507 | Lead frame sulfur removal | — | 2013-05-14 |
| 8313947 | Method for testing a contact structure | — | 2012-11-20 |
| 7445976 | Method of forming a semiconductor device having an interlayer and structure therefor | James K. Schaeffer, Srikanth B. Samavedam | 2008-11-04 |
| 7439105 | Metal gate with zirconium | — | 2008-10-21 |
| 7091568 | Electronic device including dielectric layer, and a process for forming the electronic device | Alexander Demkov, Philip J. Tobin, Dina H. Triyoso | 2006-08-15 |
| 6717226 | Transistor with layered high-K gate dielectric and method therefor | Joe Mogab, Philip J. Tobin, Hsing-Huang Tseng, Chun-Li Liu, Leonard Borucki +3 more | 2004-04-06 |
| 6432779 | Selective removal of a metal oxide dielectric | Christopher C. Hobbs, Philip J. Tobin | 2002-08-13 |
| 6383873 | Process for forming a structure | Philip J. Tobin, Amit Sureshkumar Nangia | 2002-05-07 |
| 6300202 | Selective removal of a metal oxide dielectric | Christopher C. Hobbs, Phillip J. Tobin | 2001-10-09 |
| 6297173 | Process for forming a semiconductor device | Philip J. Tobin, Hsing-Huang Tseng, David L. O'Meara, Victor Wang | 2001-10-02 |
| 6255204 | Method for forming a semiconductor device | Philip J. Tobin, Olubunmi O. Adetutu, Bikas Maiti | 2001-07-03 |
| 6187682 | Inert plasma gas surface cleaning process performed insitu with physical vapor deposition (PVD) of a layer of material | Dean J. Denning, Sam S. Garcia, Robert W. Fiordalice | 2001-02-13 |
| 6136682 | Method for forming a conductive structure having a composite or amorphous barrier layer | Dean J. Denning, Jeffrey L. Klein, Philip J. Tobin | 2000-10-24 |