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Alignment method for semiconductor processing |
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2013-08-20 |
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Predicting wafer failure using learned probability |
Robert J. Baseman, Susan G. Conti, Michal Rosen-Zvi, Frederick A. Scholl |
2011-06-14 |
| 7957826 |
Methods for normalizing error in photolithographic processes |
Christopher P. Ausschnitt, Richard H. Broberg, David Crow, Keith Roberts |
2011-06-07 |
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Method to control semiconductor device overlay using post etch image metrology |
Christopher P. Ausschnitt |
2011-02-01 |
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Method for determining semiconductor overlay on groundrule devices |
Christopher P. Ausschnitt |
2005-12-13 |
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Combined layer-to-layer and within-layer overlay control system |
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2003-10-28 |
| 5757507 |
Method of measuring bias and edge overlay error for sub-0.5 micron ground rules |
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1998-05-26 |
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Edge overlay measurement target for sub-0.5 micron ground rules |
Christopher P. Ausschnitt |
1998-01-27 |