Issued Patents All Time
Showing 25 most recent of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10824081 | Metrology method for a semiconductor manufacturing process | Vincent Truffert | 2020-11-03 |
| 10656535 | Metrology method for a semiconductor manufacturing process | Vincent Truffert | 2020-05-19 |
| 10481504 | Method and apparatus for semiconductor manufacturing | Vincent Truffert | 2019-11-19 |
| 9411249 | Differential dose and focus monitor | Timothy A. Brunner | 2016-08-09 |
| 9360858 | Alignment data based process control system | Timothy A. Brunner, Allen H. Gabor, Oleg Gluschenkov, Vinayan C. Menon | 2016-06-07 |
| 9257351 | Metrology marks for bidirectional grating superposition patterning processes | Nelson Felix, Scott Halle | 2016-02-09 |
| 9097989 | Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control | Jaime D. Morillo, Jed H. Rankin, Roger J. Yerdon | 2015-08-04 |
| 9087740 | Fabrication of lithographic image fields using a proximity stitch metrology | Jaime D. Morillo, Roger J. Yerdon | 2015-07-21 |
| 9059102 | Metrology marks for unidirectional grating superposition patterning processes | Nelson Felix, Scott D. Halle | 2015-06-16 |
| 8874249 | Discrete sampling based nonlinear control system | — | 2014-10-28 |
| 8847416 | Multi-layer chip overlay target and measurement | Nelson Felix, Allen H. Gabor | 2014-09-30 |
| 8638438 | Self-calibrated alignment and overlay target and measurement | Nelson Felix | 2014-01-28 |
| 8626328 | Discrete sampling based nonlinear control system | — | 2014-01-07 |
| 8361683 | Multi-layer chip overlay target and measurement | Allen H. Gabor, Nelson Felix | 2013-01-29 |
| 8339605 | Multilayer alignment and overlay target and measurement method | Lewis A. Binns, Jaime D. Morillo, Nigel P. Smith | 2012-12-25 |
| 8107079 | Multi layer alignment and overlay target and measurement method | Lewis A. Binns, Jaime D. Morillo, Nigel P. Smith | 2012-01-31 |
| 8035824 | Differential critical dimension and overlay metrology apparatus and measurement method | — | 2011-10-11 |
| 7957826 | Methods for normalizing error in photolithographic processes | Richard H. Broberg, David Crow, William A. Muth, Keith Roberts | 2011-06-07 |
| 7879515 | Method to control semiconductor device overlay using post etch image metrology | William A. Muth | 2011-02-01 |
| 7876439 | Multi layer alignment and overlay target and measurement method | Lewis A. Binns, Jaime D. Morillo, Nigel P. Smith | 2011-01-25 |
| 7700247 | Differential critical dimension and overlay metrology apparatus and measurement method | — | 2010-04-20 |
| 7626702 | Overlay target and measurement method using reference and sub-grids | Jaime D. Morillo | 2009-12-01 |
| 7585601 | Method to optimize grating test pattern for lithography monitoring and control | Timothy A. Brunner | 2009-09-08 |
| 7474401 | Multi-layer alignment and overlay target and measurement method | Lewis A. Binns, Jaime D. Morillo, Nigel P. Smith | 2009-01-06 |
| 7455939 | Method of improving grating test pattern for lithography monitoring and controlling | Timothy A. Brunner | 2008-11-25 |