| 9097989 |
Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control |
Christopher P. Ausschnitt, Jaime D. Morillo, Jed H. Rankin |
2015-08-04 |
| 9087740 |
Fabrication of lithographic image fields using a proximity stitch metrology |
Christopher P. Ausschnitt, Jaime D. Morillo |
2015-07-21 |
| 8423945 |
Methods and systems to meet technology pattern density requirements of semiconductor fabrication processes |
Jeanne P. Bickford, Allan O. Cruz, Michelle Lynn GILL, Howard S. Landis, David V. MacDonnell, II +1 more |
2013-04-16 |
| 8039366 |
Method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout |
Karen L. Holloway, Holly LaFerrara, Alexander L. Martin, Martin E. Powell, Timothy J. Wiltshire |
2011-10-18 |
| 6908830 |
Method for printing marks on the edges of wafers |
Andrew Lu, Donald M. Odiwo |
2005-06-21 |
| 5304441 |
Method of optimizing exposure of photoresist by patterning as a function of thermal modeling |
Donald J. Samuels |
1994-04-19 |
