Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9097989 | Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control | Christopher P. Ausschnitt, Jaime D. Morillo, Jed H. Rankin | 2015-08-04 |
| 9087740 | Fabrication of lithographic image fields using a proximity stitch metrology | Christopher P. Ausschnitt, Jaime D. Morillo | 2015-07-21 |
| 8423945 | Methods and systems to meet technology pattern density requirements of semiconductor fabrication processes | Jeanne P. Bickford, Allan O. Cruz, Michelle Lynn GILL, Howard S. Landis, David V. MacDonnell, II +1 more | 2013-04-16 |
| 8039366 | Method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout | Karen L. Holloway, Holly LaFerrara, Alexander L. Martin, Martin E. Powell, Timothy J. Wiltshire | 2011-10-18 |
| 6908830 | Method for printing marks on the edges of wafers | Andrew Lu, Donald M. Odiwo | 2005-06-21 |
| 5304441 | Method of optimizing exposure of photoresist by patterning as a function of thermal modeling | Donald J. Samuels | 1994-04-19 |