CA

Christopher P. Ausschnitt

IBM: 54 patents #1,518 of 70,183Top 3%
Globalfoundries: 3 patents #1,029 of 4,424Top 25%
IV Imec Vzw: 3 patents #192 of 1,046Top 20%
NI Nanometrics Incorporated: 2 patents #40 of 127Top 35%
PE Perkinelmer: 2 patents #151 of 671Top 25%
SL Shipley Company, L.L.C.: 1 patents #226 of 401Top 60%
AT Accent Optical Technologies: 1 patents #9 of 15Top 60%
📍 Naples, FL: #7 of 980 inventorsTop 1%
🗺 Florida: #371 of 67,251 inventorsTop 1%
Overall (All Time): #35,913 of 4,157,543Top 1%
63
Patents All Time

Issued Patents All Time

Showing 51–63 of 63 patents

Patent #TitleCo-InventorsDate
5965309 Focus or exposure dose parameter control system using tone reversing patterns Timothy A. Brunner, Mark E. Lagus 1999-10-12
5953128 Optically measurable serpentine edge tone reversed targets Timothy A. Brunner, Alan C. Thomas 1999-09-14
5914784 Measurement method for linewidth metrology Timothy A. Brunner 1999-06-22
5877861 Method for overlay control system Timothy J. Wiltshire 1999-03-02
5805290 Method of optical metrology of unresolved pattern arrays Timothy A. Brunner 1998-09-08
5790254 Monitoring of minimum features on a substrate 1998-08-04
5757507 Method of measuring bias and edge overlay error for sub-0.5 micron ground rules William A. Muth 1998-05-26
5731877 Automated system utilizing self-labeled target by pitch encoding 1998-03-24
5712707 Edge overlay measurement target for sub-0.5 micron ground rules William A. Muth 1998-01-27
5629772 Monitoring of minimum features on a substrate 1997-05-13
4890239 Lithographic process analysis and control system Edward A. McFadden, Raul V. Tan 1989-12-26
4538105 Overlay test wafer 1985-08-27
4290384 Coating apparatus David A. Huchital 1981-09-22