Issued Patents All Time
Showing 26–50 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7439001 | Focus blur measurement and control method | Timothy A. Brunner, Shahid Butt, Daniel A. Corliss | 2008-10-21 |
| 7359054 | Overlay target and measurement method using reference and sub-grids | Jaime D. Morillo | 2008-04-15 |
| 7042551 | Method of patterning process metrology based on the intrinsic focus offset | — | 2006-05-09 |
| 6975398 | Method for determining semiconductor overlay on groundrule devices | William A. Muth | 2005-12-13 |
| 6937337 | Overlay target and measurement method using reference and sub-grids | Jaime D. Morillo | 2005-08-30 |
| 6879400 | Single tone process window metrology target and method for lithographic processing | Timothy A. Brunner | 2005-04-12 |
| 6869739 | Integrated lithographic print and detection model for optical CD | Ronald Gordon, Christopher J. Progler, Alan E. Rosenbluth | 2005-03-22 |
| 6842237 | Phase shifted test pattern for monitoring focus and aberrations in optical projection systems | Timothy A. Brunner, Joseph P. Kirk, Nakgeuon Seong | 2005-01-11 |
| 6803995 | Focus control system | — | 2004-10-12 |
| 6766211 | Structure and method for amplifying target overlay errors using the synthesized beat signal between interleaved arrays of differing periodicity | — | 2004-07-20 |
| 6638671 | Combined layer-to-layer and within-layer overlay control system | William A. Muth | 2003-10-28 |
| 6460265 | Double-sided wafer exposure method and device | H. Bernhard Pogge | 2002-10-08 |
| 6429667 | Electrically testable process window monitor for lithographic processing | Christopher E. Obszarny | 2002-08-06 |
| 6417929 | Optical measurement of lithographic power bias of minimum features | Christopher J. Progler | 2002-07-09 |
| 6346979 | Process and apparatus to adjust exposure dose in lithography systems | Scott M. Mansfield, Mark Neisser, Christopher D. Wait | 2002-02-12 |
| 6335151 | Micro-surface fabrication process | Nancy Anne Greco, Ernest N. Levine | 2002-01-01 |
| 6317211 | Optical metrology tool and method of using same | Timothy A. Brunner | 2001-11-13 |
| 6183919 | Darkfield imaging for enhancing optical detection of edges and minimum features | Christopher J. Progler | 2001-02-06 |
| 6137578 | Segmented bar-in-bar target | — | 2000-10-24 |
| 6130750 | Optical metrology tool and method of using same | Timothy A. Brunner | 2000-10-10 |
| 6128089 | Combined segmented and nonsegmented bar-in-bar targets | Diana Nyyssonen, deceased, by Jeffrey Swing, executor | 2000-10-03 |
| 6027842 | Process for controlling etching parameters | Timothy A. Brunner | 2000-02-22 |
| 6020966 | Enhanced optical detection of minimum features using depolarization | Christopher J. Progler | 2000-02-01 |
| 6004706 | Etching parameter control system process | Timothy A. Brunner, Mark E. Lagus | 1999-12-21 |
| 5976740 | Process for controlling exposure dose or focus parameters using tone reversing pattern | Timothy A. Brunner | 1999-11-02 |