Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10768521 | Extreme ultraviolet (EUV) mask absorber and method for forming the same | Lei Zhuang, Jed H. Rankin | 2020-09-08 |
| 9904757 | Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs) | Ioana Graur | 2018-02-27 |
| 9405186 | Sample plan creation for optical proximity correction with minimal number of clips | Nathalie Casati, Maria Gabrani, James M. Oberschmidt, Ramya Viswanathan, Josef S. Watts | 2016-08-02 |
| 8443309 | Multifeature test pattern for optical proximity correction model verification | — | 2013-05-14 |
| 8161421 | Calibration and verification structures for use in optical proximity correction | Ramya Viswanathan, Henning Haffner, Oseo Park, Michael E. Scaman | 2012-04-17 |
| 7900169 | OPC model calibration process | — | 2011-03-01 |
| 7741012 | Method for removal of immersion lithography medium in immersion lithography processes | Adam R. Pawloski, Gilles Amblard, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more | 2010-06-22 |
| 7014966 | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems | Adam R. Pawloski, Gilles Amblard, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more | 2006-03-21 |
| 6806007 | EUV mask which facilitates electro-static chucking | Bruno M. LaFontaine | 2004-10-19 |