| 10768521 |
Extreme ultraviolet (EUV) mask absorber and method for forming the same |
Lei Zhuang, Jed H. Rankin |
2020-09-08 |
| 9904757 |
Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs) |
Ioana Graur |
2018-02-27 |
| 9405186 |
Sample plan creation for optical proximity correction with minimal number of clips |
Nathalie Casati, Maria Gabrani, James M. Oberschmidt, Ramya Viswanathan, Josef S. Watts |
2016-08-02 |
| 8443309 |
Multifeature test pattern for optical proximity correction model verification |
— |
2013-05-14 |
| 8161421 |
Calibration and verification structures for use in optical proximity correction |
Ramya Viswanathan, Henning Haffner, Oseo Park, Michael E. Scaman |
2012-04-17 |
| 7900169 |
OPC model calibration process |
— |
2011-03-01 |
| 7741012 |
Method for removal of immersion lithography medium in immersion lithography processes |
Adam R. Pawloski, Gilles Amblard, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more |
2010-06-22 |
| 7014966 |
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
Adam R. Pawloski, Gilles Amblard, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson +3 more |
2006-03-21 |
| 6806007 |
EUV mask which facilitates electro-static chucking |
Bruno M. LaFontaine |
2004-10-19 |