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Process variability tolerant hard mask for replacement metal gate finFET devices |
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| 8704332 |
Metal oxide semiconductor field effect transistor (MOSFET) gate termination |
Christopher V. Baiocco, Daniel Jaeger, Carl Radens |
2014-04-22 |
| 8697339 |
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Haoren Zhuang, Chong-Kwang Chang, Alois Gutmann, Jingyu Lian, Matthias Lipinski +1 more |
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| 8642475 |
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Xiang Hu, Arifuzzaman (Arif) Sheikh, Habib Hichri, Richard Wise |
2014-02-04 |
| 8629028 |
Metal oxide semiconductor field effect transistor (MOSFET) gate termination |
Christopher V. Baiocco, Daniel Jaeger, Carl Radens |
2014-01-14 |
| 8564074 |
Self-limiting oxygen seal for high-K dielectric and design structure |
Terence B. Hook, Vijay Narayanan, Jay M. Shah, Melanie J. Sherony, Kenneth J. Stein +1 more |
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| 8507346 |
Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer |
Martin Burkhardt, Matthew E. Colburn, Allen H. Gabor, Oleg Gluschenkov, Scott D. Halle +1 more |
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| 8158334 |
Methods for forming a composite pattern including printed resolution assist features |
Allen H. Gabor, Scott D. Halle |
2012-04-17 |
| 8039203 |
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| 7759235 |
Semiconductor device manufacturing methods |
Haoren Zhuang, Len Yuan Tsou, Scott D. Halle |
2010-07-20 |
| 7550303 |
Systems and methods for overlay shift determination |
Patricia Argandona, Faisal Azam, Andrew Lu |
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| 7084427 |
Systems and methods for overlay shift determination |
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2006-08-01 |
