ML

Matthias Lipinski

Infineon Technologies Ag: 15 patents #596 of 7,486Top 8%
SA Siemens Aktiengesellschaft: 3 patents #4,667 of 22,248Top 25%
Samsung: 2 patents #37,631 of 75,807Top 50%
CM Chartered Semiconductor Manufacturing: 1 patents #419 of 840Top 50%
OG Osram Opto Semiconductors Gmbh: 1 patents #707 of 1,154Top 65%
IBM: 1 patents #44,794 of 70,183Top 65%
📍 Wappingers Falls, NY: #104 of 884 inventorsTop 15%
🗺 New York: #7,406 of 115,490 inventorsTop 7%
Overall (All Time): #240,193 of 4,157,543Top 6%
19
Patents All Time

Issued Patents All Time

Showing 1–19 of 19 patents

Patent #TitleCo-InventorsDate
8697339 Semiconductor device manufacturing methods Haoren Zhuang, Chong-Kwang Chang, Alois Gutmann, Jingyu Lian, Len Yuan Tsou +1 more 2014-04-15
8394574 Metrology systems and methods for lithography processes Chandrasekhar Sarma, Jingyu Lian, Haoren Zhuang 2013-03-12
8349528 Semiconductor devices and methods of manufacturing thereof Alois Gutmann, Jingyu Lian, Chandrasekhar Sarma, Haoren Zhuang 2013-01-08
8071261 Lithography masks and methods of manufacture thereof Alois Gutmann, Sajan Marokkey, Henning Haffner, Chandrasekhar Sarma, Haoren Zhuang 2011-12-06
8067135 Metrology systems and methods for lithography processes Chandrasekhar Sarma, Jingyu Lian, Haoren Zhuang 2011-11-29
8063406 Semiconductor device having a polysilicon layer with a non-constant doping profile Haoren Zhuang, Jingyu Lian, Chandrasekhar Sarma 2011-11-22
8007985 Semiconductor devices and methods of manufacturing thereof Alois Gutmann, Jingyu Lian, Chandrasekhar Sarma, Haoren Zhuang 2011-08-30
7892939 Threshold voltage consistency and effective width in same-substrate device groups Roland Hampp, Manfred Eller, Jin-Ping Han 2011-02-22
7842579 Method for manufacturing a semiconductor device having doped and undoped polysilicon layers Haoren Zhuang, Jingyu Lian, Chandrasekhar Sarma 2010-11-30
7794903 Metrology systems and methods for lithography processes Chandrasekhar Sarma, Jingyu Lian, Haoren Zhuang 2010-09-14
7674350 Feature dimension control in a manufacturing process Haoren Zhuang, Alois Gutmann, Chandrasekhar Sarma, Jingyu Lian 2010-03-09
7541234 Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas Chong-Kwang Chang, Haoren Zhuang, Shailendra Mishra, O Sung Kwon, Tjin Tjin Tjoa +1 more 2009-06-02
7223525 Process for generating a hard mask for the patterning of a layer 2007-05-29
6933538 Plasma encapsulation for electronic and microelectronic components such as organic light emitting diodes Arvid Hunze, Rainer Leuschner, Egon Mergenthaler, Wolfgang Rogler, Georg Wittmann 2005-08-23
6835663 Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable etch resistivity 2004-12-28
6815364 Tungsten hard mask George Stojakovic 2004-11-09
6576358 Method of discharging reaction water in PEM fuel cells and fuel cell for carrying out the method Ulrich Gebhardt, Rainer Leuschner, Manfred Waidhas 2003-06-10
6503655 Gas diffusion electrode and its production Raino PETRICEVIC, Jochen Fricke, Rainer Leuschner 2003-01-07
6361666 Gas diffusion electron, process for producing an electrode an carbonizable composite Rainer Leuschner 2002-03-26