Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7261981 | System and method of smoothing mask shapes for improved placement of sub-resolution assist features | Mark A. Lavin, Lars Liebmann, Maharaj Mukherjee, Zengqin Zhao | 2007-08-28 |
| 7029830 | Precision and apertures for lithographic systems | Steven A. Cordes, Michael James Cordes, James L. Speidell | 2006-04-18 |
| 6602728 | Method for generating a proximity model based on proximity rules | Lars Liebmann, Alfred Wong | 2003-08-05 |
| 6553559 | Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions | Lars Liebmann, Alfred Wong | 2003-04-22 |
| 6541166 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Timothy A. Brunner, James A. Culp, Alfred Wong | 2003-04-01 |
| 6526164 | Intelligent photomask disposition | Alfred Wong | 2003-02-25 |
| 6421820 | Semiconductor device fabrication using a photomask with assist features | Lars Liebmann, Shahid Butt, Henning Haffner | 2002-07-16 |
| 6413683 | Method for incorporating sub resolution assist features in a photomask layout | Lars Liebmann | 2002-07-02 |
| 6346979 | Process and apparatus to adjust exposure dose in lithography systems | Christopher P. Ausschnitt, Mark Neisser, Christopher D. Wait | 2002-02-12 |
| 5965306 | Method of determining the printability of photomask defects | Richard A. Ferguson, Alfred Wong | 1999-10-12 |
| 5932377 | Exact transmission balanced alternating phase-shifting mask for photolithography | Richard A. Ferguson, Lars Liebmann, David S. O'Grady, Alfred Wong | 1999-08-03 |
| 5768017 | Optical system for producing uniform line illumination | Mark R. King, William Harry Vonderhaar | 1998-06-16 |
| 5757842 | Method and apparatus for compensating thermal lensing effects in a laser cavity | Mark J. LaPlante, David C. Long | 1998-05-26 |
| 5125750 | Optical recording system employing a solid immersion lens | Timothy R. Corle, Gordon S. Kino | 1992-06-30 |
| 5121256 | Lithography system employing a solid immersion lens | Timothy R. Corle, Gordon S. Kino | 1992-06-09 |
| 5004307 | Near field and solid immersion optical microscope | Gordon S. Kino | 1991-04-02 |