Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6627361 | Assist features for contact hole mask patterns | Orest Bula, Steven J. Holmes, Paul A. Rabidoux | 2003-09-30 |
| 6582857 | Repair of masks to promote adhesion of patches | Philip Flanigan, Dennis M. Hayden, Timothy E. Neary | 2003-06-24 |
| 6368881 | Wafer thickness control during backside grind | Donald W. Brouillette, Thomas G. Ference, Harold G. Linde, Ronald L. Mendelson | 2002-04-09 |
| 6284443 | Method and apparatus for image adjustment | Brent A. Anderson, Subramian S. Iyer | 2001-09-04 |
| 6190836 | Methods for repair of photomasks | Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, J. Peter Levin, Timothy E. Neary +4 more | 2001-02-20 |
| 6165649 | Methods for repair of photomasks | Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, J. Peter Levin, Timothy E. Neary +4 more | 2000-12-26 |
| 6156461 | Method for repair of photomasks | Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, J. Peter Levin, Timothy E. Neary +4 more | 2000-12-05 |
| 6122056 | Direct phase shift measurement between interference patterns using aerial image measurement tool | Song Peng | 2000-09-19 |
| 6110624 | Multiple polarity mask exposure method | Timothy E. Neary, David S. O'Grady, Denis Rigaill | 2000-08-29 |
| 6096458 | Methods for manufacturing photolithography masks utilizing interfering beams of radiation | — | 2000-08-01 |
| 6090507 | Methods for repair of photomasks | Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, J. Peter Levin, Timothy E. Neary +4 more | 2000-07-18 |
| 5973771 | Pupil imaging reticle for photo steppers | Dean C. Humphrey, Grant N. Pealer, III, Barbara Bates Peck | 1999-10-26 |
| 5955222 | Method of making a rim-type phase-shift mask and mask manufactured thereby | Steven J. Holmes, Ahmad D. Katnani, Wayne M. Moreau, Niranjan M. Patel | 1999-09-21 |
| 5614990 | Illumination tailoring system using photochromic filter | James A. Bruce, Joseph E. Gortych | 1997-03-25 |
| 5552718 | Electrical test structure and method for space and line measurement | James A. Bruce, Robert K. Leidy | 1996-09-03 |
| 5508803 | Method and apparatus for monitoring lithographic exposure | William C. Joyce | 1996-04-16 |
| 5300786 | Optical focus phase shift test pattern, monitoring system and process | Timothy A. Brunner, Barbara Bates Peck, Chrisopher A. Spence | 1994-04-05 |