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Method of thinning a semiconductor substrate |
Steven R. Codding, Timothy C. Krywanczyk, Edmund J. Sprogis |
2011-04-26 |
| 7867876 |
Method of thinning a semiconductor substrate |
Steven R. Codding, Timothy C. Krywanczyk, Edmund J. Sprogis |
2011-01-11 |
| 7844099 |
Inspection method for protecting image sensor devices with front surface protection |
Timothy C. Krywanczyk, Erik M. Probstfield |
2010-11-30 |
| 6582857 |
Repair of masks to promote adhesion of patches |
Philip Flanigan, Dennis M. Hayden, Michael S. Hibbs |
2003-06-24 |
| 6534225 |
Tapered ion implantation with femtosecond laser ablation to remove printable alternating phase shift features |
Steven Flanders, Dennis M. Hayden |
2003-03-18 |
| 6515736 |
Reticle capturing and handling system |
Dennis M. Hayden |
2003-02-04 |
| 6415431 |
Repair of phase shift materials to enhance adhesion |
— |
2002-07-02 |
| 6346352 |
Quartz defect removal utilizing gallium staining and femtosecond ablation |
Dennis M. Hayden, John N. Ross |
2002-02-12 |
| 6338409 |
Reticle SMIF pod in situ orientation |
— |
2002-01-15 |
| 6261723 |
Transfer layer repair process for attenuated masks |
Merrilou George |
2001-07-17 |
| 6190836 |
Methods for repair of photomasks |
Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, Michael S. Hibbs, J. Peter Levin +4 more |
2001-02-20 |
| 6165649 |
Methods for repair of photomasks |
Brian J. Grenon, Richard A. Haight, Dennis M. Hayden, Michael S. Hibbs, J. Peter Levin +4 more |
2000-12-26 |
| 6156461 |
Method for repair of photomasks |
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2000-12-05 |
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Multiple polarity mask exposure method |
Michael S. Hibbs, David S. O'Grady, Denis Rigaill |
2000-08-29 |
| 6090507 |
Methods for repair of photomasks |
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2000-07-18 |
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Feedback method to repair phase shift masks |
Edward W. Conrad, Orest Bula |
2000-01-18 |
| 5981110 |
Method for repairing photomasks |
Merrilou George |
1999-11-09 |
| 5882823 |
Fib repair method |
— |
1999-03-16 |
| 5498313 |
Symmetrical etching ring with gas control |
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1996-03-12 |
