GG

Glenn W. Gale

IBM: 13 patents #8,581 of 70,183Top 15%
TL Tokyo Electron Limited: 3 patents #2,069 of 5,567Top 40%
Lam Research: 1 patents #1,364 of 2,128Top 65%
Overall (All Time): #277,822 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
8440573 Method and apparatus for pattern collapse free wet processing of semiconductor devices Katrina Mikhaylichenko, Denis Syomin, Qian Fu, Shenjian Liu, Mark Wilcoxson 2013-05-14
8043521 Processing apparatus 2011-10-25
7897498 Method for manufacturing semiconductor device Yoshihiro Hirota, Yusuke Muraki, Genji Nakamura, Masato Kushibiki, Naoki Shindo +3 more 2011-03-01
7250374 System and method for processing a substrate using supercritical carbon dioxide processing Joseph T. Hillman, Gunilla Jacobson, Bentley J. Palmer 2007-07-31
6783599 Method of cleaning contaminants from the surface of a substrate Frederick William Kern, Jr., William A. Syverson 2004-08-31
6565666 Capillary dry process and apparatus Russell H. Arndt, Frederick William Kern, Jr., Kenneth T. Settlemyer, Jr., William A. Syverson 2003-05-20
6514355 Method and apparatus for recovery of semiconductor wafers from a chemical tank Ernest Bias Betancourt, Jeffrey A. Brigante, William Salamon, Jr. 2003-02-04
6508014 Method of drying substrates Russell H. Arndt, James Hannah, Kenneth T. Settlemyer, Jr. 2003-01-21
6354309 Process for treating a semiconductor substrate Russell H. Arndt, Frederick William Kern, Jr., Karen P. Madden, Harald Okorn-Schmidt, George F. Ouimet +2 more 2002-03-12
6356653 Method and apparatus for combined particle location and removal Jeffrey A. Brigante, Maurice R. Hevey, Frederick William Kern, Jr., Ben Kim, Joel M. Sharrow +1 more 2002-03-12
6276370 Sonic cleaning with an interference signal Emily E. Fisch, Harald Okorn-Schmidt, William A. Syverson 2001-08-21
6254796 Selective etching of silicate David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Karen P. Madden, Harald Okorn-Schmidt +1 more 2001-07-03
6191085 Method for cleaning semiconductor devices Emanuel I. Cooper, Scott A. Estes, Rangarajan Jagannathan, Harald Okorn-Schmidt, David L. Rath 2001-02-20
6173720 Process for treating a semiconductor substrate Russell H. Arndt, Frederick William Kern, Jr., Karen P. Madden, Harald Okorn-Schmidt, George F. Ouimet +2 more 2001-01-16
6117796 Removal of silicon oxide Rangarajan Jagannathan, Karen P. Madden, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope +1 more 2000-09-12
5966631 Forced plug processing for high aspect ratio structures Bernadette Ann Pierson, William A. Syverson 1999-10-12
5962384 Method for cleaning semiconductor devices Emanuel I. Cooper, Scott A. Estes, Rangarajan Jagannathan, Harald Okorn-Schmidt, David L. Rath 1999-10-05