| 8440573 |
Method and apparatus for pattern collapse free wet processing of semiconductor devices |
Katrina Mikhaylichenko, Denis Syomin, Qian Fu, Shenjian Liu, Mark Wilcoxson |
2013-05-14 |
| 8043521 |
Processing apparatus |
— |
2011-10-25 |
| 7897498 |
Method for manufacturing semiconductor device |
Yoshihiro Hirota, Yusuke Muraki, Genji Nakamura, Masato Kushibiki, Naoki Shindo +3 more |
2011-03-01 |
| 7250374 |
System and method for processing a substrate using supercritical carbon dioxide processing |
Joseph T. Hillman, Gunilla Jacobson, Bentley J. Palmer |
2007-07-31 |
| 6783599 |
Method of cleaning contaminants from the surface of a substrate |
Frederick William Kern, Jr., William A. Syverson |
2004-08-31 |
| 6565666 |
Capillary dry process and apparatus |
Russell H. Arndt, Frederick William Kern, Jr., Kenneth T. Settlemyer, Jr., William A. Syverson |
2003-05-20 |
| 6514355 |
Method and apparatus for recovery of semiconductor wafers from a chemical tank |
Ernest Bias Betancourt, Jeffrey A. Brigante, William Salamon, Jr. |
2003-02-04 |
| 6508014 |
Method of drying substrates |
Russell H. Arndt, James Hannah, Kenneth T. Settlemyer, Jr. |
2003-01-21 |
| 6354309 |
Process for treating a semiconductor substrate |
Russell H. Arndt, Frederick William Kern, Jr., Karen P. Madden, Harald Okorn-Schmidt, George F. Ouimet +2 more |
2002-03-12 |
| 6356653 |
Method and apparatus for combined particle location and removal |
Jeffrey A. Brigante, Maurice R. Hevey, Frederick William Kern, Jr., Ben Kim, Joel M. Sharrow +1 more |
2002-03-12 |
| 6276370 |
Sonic cleaning with an interference signal |
Emily E. Fisch, Harald Okorn-Schmidt, William A. Syverson |
2001-08-21 |
| 6254796 |
Selective etching of silicate |
David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Karen P. Madden, Harald Okorn-Schmidt +1 more |
2001-07-03 |
| 6191085 |
Method for cleaning semiconductor devices |
Emanuel I. Cooper, Scott A. Estes, Rangarajan Jagannathan, Harald Okorn-Schmidt, David L. Rath |
2001-02-20 |
| 6173720 |
Process for treating a semiconductor substrate |
Russell H. Arndt, Frederick William Kern, Jr., Karen P. Madden, Harald Okorn-Schmidt, George F. Ouimet +2 more |
2001-01-16 |
| 6117796 |
Removal of silicon oxide |
Rangarajan Jagannathan, Karen P. Madden, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope +1 more |
2000-09-12 |
| 5966631 |
Forced plug processing for high aspect ratio structures |
Bernadette Ann Pierson, William A. Syverson |
1999-10-12 |
| 5962384 |
Method for cleaning semiconductor devices |
Emanuel I. Cooper, Scott A. Estes, Rangarajan Jagannathan, Harald Okorn-Schmidt, David L. Rath |
1999-10-05 |