| 6766382 |
Method of information transfer using optical zones |
Robert B. Madden |
2004-07-20 |
| 6354309 |
Process for treating a semiconductor substrate |
Russell H. Arndt, Glenn W. Gale, Frederick William Kern, Jr., Harald Okorn-Schmidt, George F. Ouimet +2 more |
2002-03-12 |
| 6254796 |
Selective etching of silicate |
David L. Rath, Glenn W. Gale, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt +1 more |
2001-07-03 |
| 6200891 |
Removal of dielectric oxides |
Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope, David L. Rath |
2001-03-13 |
| 6173720 |
Process for treating a semiconductor substrate |
Russell H. Arndt, Glenn W. Gale, Frederick William Kern, Jr., Harald Okorn-Schmidt, George F. Ouimet +2 more |
2001-01-16 |
| 6150282 |
Selective removal of etching residues |
David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope |
2000-11-21 |
| 6117796 |
Removal of silicon oxide |
Glenn W. Gale, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope +1 more |
2000-09-12 |
| 6066267 |
Etching of silicon nitride |
David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope |
2000-05-23 |
| 6033996 |
Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide |
David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope |
2000-03-07 |
| 6014310 |
High dielectric TiO.sub.2 -SiN composite films for memory applications |
Gary B. Bronner, Stephan A. Cohen, David M. Dobuzinsky, Jeffrey P. Gambino, Herbert L. Ho |
2000-01-11 |
| 5965465 |
Etching of silicon nitride |
David L. Rath, Rangarajan Jagannathan, Kenneth McCullough, Harald Okorn-Schmidt, Keith R. Pope |
1999-10-12 |
| 5876788 |
High dielectric TiO.sub.2 -SiN composite films for memory applications |
Gary B. Bronner, Stephan A. Cohen, David M. Dobuzinsky, Jeffrey P. Gambino, Herbert L. Ho |
1999-03-02 |
