| 11087065 |
Method of manufacturing devices |
Abraham SLACHTER, Brennan Peterson, Koen Wilhelmus Cornelis Adrianus Van Der Straten, Antonio CORRADI, Pieter J. Woltgens |
2021-08-10 |
| 10672939 |
Anneal techniques for chalcogenide semiconductors |
Teodor K. Todorov |
2020-06-02 |
| 10573526 |
Method of charge controlled patterning during reactive ion etching |
Bachir Dirahoui, Richard S. Wise |
2020-02-25 |
| 10096738 |
Anneal techniques for chalcogenide semiconductors |
Teodor K. Todorov |
2018-10-09 |
| 9960207 |
Spin-selective electron relay |
— |
2018-05-01 |
| 9837574 |
Anneal techniques for chalcogenide semiconductors |
Teodor K. Todorov |
2017-12-05 |
| 9748250 |
Deep trench sidewall etch stop |
Diego A. Hoyos, William L. Nicol, Iqbal Rashid Saraf, Scott R. Stiffler |
2017-08-29 |
| 9741581 |
Using tensile mask to minimize buckling in substrate |
Parul Dhagat, Anne C. Friedman, Timothy A. Brunner, Shahrukh Khan |
2017-08-22 |
| 9589965 |
Controlling epitaxial growth over eDRAM deep trench and eDRAM so formed |
Melissa A. Smith, Herbert L. Ho |
2017-03-07 |
| 9583397 |
Source/drain terminal contact and method of forming same |
Derya Deniz, Benjamin G. Moser, Domingo A. Ferrer Luppi |
2017-02-28 |
| 9496148 |
Method of charge controlled patterning during reactive ion etching |
Bachir Dirahoui, Richard S. Wise |
2016-11-15 |
| 9472709 |
Anneal techniques for chalcogenide semiconductors |
Teodor K. Todorov |
2016-10-18 |
| 9349906 |
Anneal techniques for chalcogenide semiconductors |
Teodor K. Todorov |
2016-05-24 |