| 12418290 |
Programmable and reprogrammable quantum circuit |
Charles Thomas Rettner, Michael Justin Beckley, Russell A. Budd, Vivekananda P. Adiga, David C. Mckay +1 more |
2025-09-16 |
| 12183634 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Joe Lee, Thedorus E. Standaert |
2024-12-31 |
| 12185644 |
Quantum circuit with trench capacitor |
Li-Wen Hung, Harry Jonathon Mamin, Daniel Rugar, Martin O. Sandberg, Joseph Finley |
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| 11837501 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Joe Lee, Theodorus E. Standaert |
2023-12-05 |
| 11750189 |
Programmable and reprogrammable quantum circuit |
Charles Thomas Rettner, Michael Justin Beckley, Russell A. Budd, Vivekananda P. Adiga, David C. Mckay +1 more |
2023-09-05 |
| 11683995 |
Lithography for fabricating Josephson junctions |
Kenneth P. Rodbell, Leonidas E. Ocola, Charles Thomas Rettner, Mary E. Rothwell |
2023-06-20 |
| 11587830 |
Self-forming barrier for use in air gap formation |
Benjamin D. Briggs, Takeshi Nogami, Christopher J. Penny |
2023-02-21 |
| 11257717 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Joe Lee, Theodorus E. Standaert |
2022-02-22 |
| 10832952 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Joe Lee, Theodorus E. Standaert |
2020-11-10 |
| 10763166 |
Self-forming barrier for use in air gap formation |
Benjamin D. Briggs, Takeshi Nogami, Christopher J. Penny |
2020-09-01 |
| 10672707 |
Low aspect ratio interconnect |
Benjamin D. Briggs, Raghuveer R. Patlolla, Cornelius Brown Peethala, David L. Rath, Chih-Chao Yang |
2020-06-02 |
| 10636706 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Joe Lee, Theodorus E. Standaert |
2020-04-28 |
| 10607933 |
Interconnect structures with fully aligned vias |
Daniel C. Edelstein, Nicholas C. M. Fuller, Satyanarayana V. Nitta, David L. Rath |
2020-03-31 |
| 10366940 |
Air gap and air spacer pinch off |
Griselda Bonilla, Son V. Nguyen, Takeshi Nogami, Christopher J. Penny, Deepika Priyadarshini |
2019-07-30 |
| 10276436 |
Selective recessing to form a fully aligned via |
Benjamin D. Briggs, Jessica Dechene, Joe Lee, Theodorus E. Standaert |
2019-04-30 |
| 10256171 |
Air gap and air spacer pinch off |
Griselda Bonilla, Son V. Nguyen, Takeshi Nogami, Christopher J. Penny, Deepika Priyadarshini |
2019-04-09 |
| 10256186 |
Interconnect structure having subtractive etch feature and damascene feature |
Griselda Bonilla, Samuel S. Choi, Ronald G. Filippi, Naftali E. Lustig, Andrew H. Simon |
2019-04-09 |
| 10242933 |
Air gap and air spacer pinch off |
Griselda Bonilla, Son V. Nguyen, Takeshi Nogami, Christopher J. Penny, Deepika Priyadarshini |
2019-03-26 |
| 10229851 |
Self-forming barrier for use in air gap formation |
Benjamin D. Briggs, Takeshi Nogami, Christopher J. Penny |
2019-03-12 |
| 10224236 |
Forming air gap |
Samuel S. Choi, Ronald G. Filippi, Naftali E. Lustig, Griselda Bonilla, Andrew H. Simon |
2019-03-05 |
| 10211153 |
Low aspect ratio interconnect |
Benjamin D. Briggs, Raghuveer R. Patlolla, Cornelius Brown Peethala, David L. Rath, Chih-Chao Yang |
2019-02-19 |
| 10211138 |
Metal silicate spacers for fully aligned vias |
Benjamin D. Briggs, Jessica Dechene, Joe Lee |
2019-02-19 |
| 10204856 |
Interconnect structures with fully aligned vias |
Daniel C. Edelstein, Nicholas C. M. Fuller, Satyanarayana V. Nitta, David L. Rath |
2019-02-12 |
| 10177076 |
Air gap and air spacer pinch off |
Griselda Bonilla, Son V. Nguyen, Takeshi Nogami, Christopher J. Penny, Deepika Priyadarshini |
2019-01-08 |
| 10170416 |
Selective blocking boundary placement for circuit locations requiring electromigration short-length |
Benjamin D. Briggs, Joe Lee, Christopher J. Penny |
2019-01-01 |
