Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7642016 | Phase calibration for attenuating phase-shift masks | Michael S. Hibbs | 2010-01-05 |
| 7585601 | Method to optimize grating test pattern for lithography monitoring and control | Christopher P. Ausschnitt | 2009-09-08 |
| 7473648 | Double exposure double resist layer process for forming gate patterns | James A. Culp, Lars Liebmann | 2009-01-06 |
| 7455939 | Method of improving grating test pattern for lithography monitoring and controlling | Christopher P. Ausschnitt | 2008-11-25 |
| 7439001 | Focus blur measurement and control method | Christopher P. Ausschnitt, Shahid Butt, Daniel A. Corliss | 2008-10-21 |
| 7416820 | Pellicle film optimized for immersion lithography systems with NA>1 | Michael S. Hibbs | 2008-08-26 |
| 7378738 | Method for producing self-aligned mask, articles produced by same and composition for same | Matthew E. Colburn, Elbert E. Huang, Muthumanickam Sankarapandian | 2008-05-27 |
| 7074525 | Critical dimension control of printed features using non-printing fill patterns | Chung-Hsi Wu, Shahid Butt, Patrick Speno | 2006-07-11 |
| 6950183 | Apparatus and method for inspection of photolithographic mask | Michael S. Hibbs, Christopher J. Progler | 2005-09-27 |
| 6879400 | Single tone process window metrology target and method for lithographic processing | Christopher P. Ausschnitt | 2005-04-12 |
| 6842237 | Phase shifted test pattern for monitoring focus and aberrations in optical projection systems | Christopher P. Ausschnitt, Joseph P. Kirk, Nakgeuon Seong | 2005-01-11 |
| 6576914 | Redundant printing in e-beam lithography | — | 2003-06-10 |
| 6541166 | Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures | Scott M. Mansfield, James A. Culp, Alfred Wong | 2003-04-01 |
| 6436605 | Plasma resistant composition and use thereof | Marie Angelopoulos, Ari Aviram, Edward D. Babich, Thomas B. Faure, C. Richard Guarnieri +2 more | 2002-08-20 |
| 6317211 | Optical metrology tool and method of using same | Christopher P. Ausschnitt | 2001-11-13 |
| 6130750 | Optical metrology tool and method of using same | Christopher P. Ausschnitt | 2000-10-10 |
| 6114096 | Asymmetrical resist sidewall | Rebecca D. Mih, Donald C. Wheeler | 2000-09-05 |
| 6048651 | Fresnel zone mask for pupilgram | Joseph P. Kirk, Christopher J. Progler | 2000-04-11 |
| 6027842 | Process for controlling etching parameters | Christopher P. Ausschnitt | 2000-02-22 |
| 6004706 | Etching parameter control system process | Christopher P. Ausschnitt, Mark E. Lagus | 1999-12-21 |
| 5976740 | Process for controlling exposure dose or focus parameters using tone reversing pattern | Christopher P. Ausschnitt | 1999-11-02 |
| 5965309 | Focus or exposure dose parameter control system using tone reversing patterns | Christopher P. Ausschnitt, Mark E. Lagus | 1999-10-12 |
| 5953128 | Optically measurable serpentine edge tone reversed targets | Christopher P. Ausschnitt, Alan C. Thomas | 1999-09-14 |
| 5948571 | Asymmetrical resist sidewall | Rebecca D. Mih, Donald C. Wheeler | 1999-09-07 |
| 5914784 | Measurement method for linewidth metrology | Christopher P. Ausschnitt | 1999-06-22 |