Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11182531 | Optical rule checking for detecting at risk structures for overlay issues | William Brearley | 2021-11-23 |
| 11163934 | Optical rule checking for detecting at risk structures for overlay issues | William Brearley | 2021-11-02 |
| 10739253 | Methods, systems, and devices for calibrating light sensing devices | Emmanuel Dumont | 2020-08-11 |
| 10732034 | Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure | Emmanuel Dumont, Mauricio Contreras | 2020-08-04 |
| 10527490 | Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure | Emmanuel Dumont, Mauricio Contreras | 2020-01-07 |
| 10527491 | Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure | Emmanuel Dumont, Mauricio Contreras | 2020-01-07 |
| 10395002 | Optical rule checking for detecting at risk structures for overlay issues | William Brearley | 2019-08-27 |
| 10378953 | Methods for guiding personal limit selection in UV dosimetry | Emmanuel Dumont | 2019-08-13 |
| 10339261 | Optical rule checking for detecting at risk structures for overlay issues | William Brearley | 2019-07-02 |
| D829112 | Sensing device | Emmanuel Dumont, Mauricio Contreras | 2018-09-25 |
| 9880052 | Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure | Emmanuel Dumont, Mauricio Contreras | 2018-01-30 |
| 9880725 | Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure | Emmanuel Dumont, Mauricio Contreras | 2018-01-30 |
| 9798458 | Methods, systems, and apparatuses for accurate measurement and real-time feedback of solar ultraviolet exposure | Emmanuel Dumont, Mauricio Contreras | 2017-10-24 |
| 9626459 | Detecting hotspots using machine learning on diffraction patterns | Kanak B. Agarwal, Piyush Pathak | 2017-04-18 |
| 9607268 | Optical rule checking for detecting at risk structures for overlay issues | William Brearley | 2017-03-28 |
| 9536039 | Optical proximity correction (OPC) accounting for critical dimension (CD) variation from inter-level effects | Dureseti Chidambarrao, Dongbing Shao | 2017-01-03 |
| 9342648 | Optical proximity correction (OPC) accounting for critical dimension (CD) variation from inter-level effects | Dureseti Chidambarrao, Dongbing Shao | 2016-05-17 |
| 9330223 | Optical rule checking for detecting at risk structures for overlay issues | William Brearley | 2016-05-03 |
| 9311442 | Net-voltage-aware optical proximity correction (OPC) | James A. Culp, Ian P. Stobert | 2016-04-12 |
| 8782573 | Solutions for retargeting integrated circuit layouts based on diffraction pattern analysis | Kanak B. Agarwal | 2014-07-15 |
| 8689151 | Pitch-aware multi-patterning lithography | Kanak B. Agarwal | 2014-04-01 |
| 8647893 | Method for post decomposition density balancing in integrated circuit layouts, related system and program product | Kanak B. Agarwal, Lars Liebmann | 2014-02-11 |
| 8627244 | Frequency domain layout decomposition in double patterning lithography | Kanak B. Agarwal | 2014-01-07 |
| 8627245 | Density balancing in multiple patterning lithography using integrated circuit layout fill | Lars Liebmann, Ian P. Stobert | 2014-01-07 |
| 8612902 | Retargeting multiple patterned integrated circuit device designs | Kanak B. Agarwal | 2013-12-17 |