Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9741396 | Converting apparatus, contents converting method, and computer readable recording medium | Bong-gil Bak, Sung-wook Park | 2017-08-22 |
| 9454995 | Information storage medium storing content, content providing method, content reproducing method and apparatus therefor | Sung-Ryeul Rhyu, Bong-gil Bak | 2016-09-27 |
| 9147424 | Apparatus and method for reproducing an optical recording, and computer-readable recording medium | Bong-gil Bak, Sung-Ryeul Rhyu, Min Seok Kim | 2015-09-29 |
| 9124858 | Content processing apparatus for processing high resolution content and content processing method thereof | Yong-seok JANG, Sung-wook Park, Tae-yun Chung, Min Seok Kim, Bong-gil Bak +2 more | 2015-09-01 |
| 8338245 | Integrated circuit system employing stress-engineered spacers | Jae Gon Lee, Victor Chan, Jun Jung Kim | 2012-12-25 |
| 8198194 | Methods of forming p-channel field effect transistors having SiGe source/drain regions | Hyung-Rae Lee, Jin-Ping Han, Chung Woh Lai, Henry K. Utomo, Thomas W. Dyer | 2012-06-12 |
| 8030196 | Transistor formation using capping layer | Bong-Seok Seo, Dong-Hee Yu, O Sung Kwon, Oh-Jung Kwon | 2011-10-04 |
| 7935593 | Stress optimization in dual embedded epitaxially grown semiconductor processing | Jin-Ping Han, Chung Woh Lai, Henry K. Utomo | 2011-05-03 |
| 7838372 | Methods of manufacturing semiconductor devices and structures thereof | Jin-Ping Han, Chung Woh Lai, Henry K. Utomo | 2010-11-23 |
| 7790622 | Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processes | Kyoung-Woo Lee, Ja-Hum Ku, Jun Jung Kim, Chong-Kwang Chang, Min-Chul Sun +1 more | 2010-09-07 |
| 7651729 | Method of fabricating metal silicate layer using atomic layer deposition technique | Yun Seok Kim, Jong-Pyo Kim, Ha-Jin Lim, Jae-Eun Park, Hyung-Suk Jung +1 more | 2010-01-26 |
| 7510969 | Electrode line structure having fine line width and method of forming the same | Joo Won Lee, Kang-soo Chu, Jae-Eun Park | 2009-03-31 |
| 7396777 | Method of fabricating high-k dielectric layer having reduced impurity | Hyung-Suk Jung, Jong Ho Lee, Ha-Jin Lim, Jae-Eun Park, Yun Seok Kim | 2008-07-08 |
| 7180190 | Electrode line structure having fine line width and method of forming the same | Joo Won Lee, Kang-soo Chu, Jae-Eun Park | 2007-02-20 |
| 7084076 | Method for forming silicon dioxide film using siloxane | Jae-Eun Park, Kang-soo Chu, Joo Won Lee | 2006-08-01 |
| 6992019 | Methods for forming silicon dioxide layers on substrates using atomic layer deposition | Joo Won Lee, Jae-Eun Park, Kang-soo Chu | 2006-01-31 |
| 6989231 | Method of forming fine patterns using silicon oxide layer | Jae-Eun Park, Kang-soo Chu, Joo Won Lee | 2006-01-24 |
| 6933245 | Method of forming a thin film with a low hydrogen content on a semiconductor device | Seung Hwan Lee | 2005-08-23 |
| 6858533 | Semiconductor device having an etch stopper formed of a sin layer by low temperature ALD and method of fabricating the same | Kang-soo Chu, J o-won Lee, Jae-Eun Park | 2005-02-22 |