| 9741396 |
Converting apparatus, contents converting method, and computer readable recording medium |
Bong-gil Bak, Sung-wook Park |
2017-08-22 |
| 9454995 |
Information storage medium storing content, content providing method, content reproducing method and apparatus therefor |
Sung-Ryeul Rhyu, Bong-gil Bak |
2016-09-27 |
| 9147424 |
Apparatus and method for reproducing an optical recording, and computer-readable recording medium |
Bong-gil Bak, Sung-Ryeul Rhyu, Min Seok Kim |
2015-09-29 |
| 9124858 |
Content processing apparatus for processing high resolution content and content processing method thereof |
Yong-seok JANG, Sung-wook Park, Tae-yun Chung, Min Seok Kim, Bong-gil Bak +2 more |
2015-09-01 |
| 8338245 |
Integrated circuit system employing stress-engineered spacers |
Jae Gon Lee, Victor Chan, Jun Jung Kim |
2012-12-25 |
| 8198194 |
Methods of forming p-channel field effect transistors having SiGe source/drain regions |
Hyung-Rae Lee, Jin-Ping Han, Chung Woh Lai, Henry K. Utomo, Thomas W. Dyer |
2012-06-12 |
| 8030196 |
Transistor formation using capping layer |
Bong-Seok Seo, Dong-Hee Yu, O Sung Kwon, Oh-Jung Kwon |
2011-10-04 |
| 7935593 |
Stress optimization in dual embedded epitaxially grown semiconductor processing |
Jin-Ping Han, Chung Woh Lai, Henry K. Utomo |
2011-05-03 |
| 7838372 |
Methods of manufacturing semiconductor devices and structures thereof |
Jin-Ping Han, Chung Woh Lai, Henry K. Utomo |
2010-11-23 |
| 7790622 |
Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processes |
Kyoung-Woo Lee, Ja-Hum Ku, Jun Jung Kim, Chong-Kwang Chang, Min-Chul Sun +1 more |
2010-09-07 |
| 7651729 |
Method of fabricating metal silicate layer using atomic layer deposition technique |
Yun Seok Kim, Jong-Pyo Kim, Ha-Jin Lim, Jae-Eun Park, Hyung-Suk Jung +1 more |
2010-01-26 |
| 7510969 |
Electrode line structure having fine line width and method of forming the same |
Joo Won Lee, Kang-soo Chu, Jae-Eun Park |
2009-03-31 |
| 7396777 |
Method of fabricating high-k dielectric layer having reduced impurity |
Hyung-Suk Jung, Jong Ho Lee, Ha-Jin Lim, Jae-Eun Park, Yun Seok Kim |
2008-07-08 |
| 7180190 |
Electrode line structure having fine line width and method of forming the same |
Joo Won Lee, Kang-soo Chu, Jae-Eun Park |
2007-02-20 |
| 7084076 |
Method for forming silicon dioxide film using siloxane |
Jae-Eun Park, Kang-soo Chu, Joo Won Lee |
2006-08-01 |
| 6992019 |
Methods for forming silicon dioxide layers on substrates using atomic layer deposition |
Joo Won Lee, Jae-Eun Park, Kang-soo Chu |
2006-01-31 |
| 6989231 |
Method of forming fine patterns using silicon oxide layer |
Jae-Eun Park, Kang-soo Chu, Joo Won Lee |
2006-01-24 |
| 6933245 |
Method of forming a thin film with a low hydrogen content on a semiconductor device |
Seung Hwan Lee |
2005-08-23 |
| 6858533 |
Semiconductor device having an etch stopper formed of a sin layer by low temperature ALD and method of fabricating the same |
Kang-soo Chu, J o-won Lee, Jae-Eun Park |
2005-02-22 |
