Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7846790 | Method of fabricating semiconductor device having multiple gate dielectric layers and semiconductor device fabricated thereby | Sung-Gun Kang | 2010-12-07 |
| 7726777 | Inkjet print head and method of fabricating the same | Jae-sik Min, Young-ung Ha | 2010-06-01 |
| 7510969 | Electrode line structure having fine line width and method of forming the same | Joo Won Lee, Jae-Eun Park, Jong-ho Yang | 2009-03-31 |
| 7394641 | MEMS tunable capacitor with a wide tuning range | Seok-Jun Won, Weon-Hong Kim | 2008-07-01 |
| 7203052 | Method of fabricating MEMS tunable capacitor with wide tuning range | Seok-Jun Won, Weon-Hong Kim | 2007-04-10 |
| 7180190 | Electrode line structure having fine line width and method of forming the same | Joo Won Lee, Jae-Eun Park, Jong-ho Yang | 2007-02-20 |
| 7084076 | Method for forming silicon dioxide film using siloxane | Jae-Eun Park, Joo Won Lee, Jong-ho Yang | 2006-08-01 |
| 7042698 | MEMS tunable capacitor with a wide tuning range and method of fabricating the same | Seok-Jun Won, Weon-Hong Kim | 2006-05-09 |
| 6992019 | Methods for forming silicon dioxide layers on substrates using atomic layer deposition | Joo Won Lee, Jae-Eun Park, Jong-ho Yang | 2006-01-31 |
| 6989231 | Method of forming fine patterns using silicon oxide layer | Jae-Eun Park, Joo Won Lee, Jong-ho Yang | 2006-01-24 |
| 6858533 | Semiconductor device having an etch stopper formed of a sin layer by low temperature ALD and method of fabricating the same | J o-won Lee, Jae-Eun Park, Jong-ho Yang | 2005-02-22 |