Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › SOI substrates and SOI devices, and methods for forming the same

SOI substrates and SOI devices, and methods for forming the same

US Patent 8159031 · Granted Apr 17, 2012

Estimated economic value: $5,847,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

P-type field effect transistor (PFET) on a silicon germanium (Ge) buffer layer t2025
FinFET semiconductor device2025
Multiple wavelength band optical switching unit2024
Back-end-of-line (BEOL) high resistance (Hi-R) conductor layer in a metal oxide 2024
Three dimensional (3D) vertical spiral inductor and transformer2024
Gate contact isolation in a semiconductor2024
Semiconductor having a source/drain contact with a single inner spacer2024
Fin field-effect transistor (FinFET) static random access memory (SRAM) having p2023
Artificial neural networks with precision weight for artificial intelligence2023
Digital integrated circuit with embedded memory for neural network inferring2023
Multiple accelerators for neural network2023
Nanosheet (NS) and fin field-effect transistor (FinFET) hybrid integration2023