Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6503692 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Wayne M. Moreau | 2003-01-07 |
| 6458907 | Organometallic polymers and use thereof | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri | 2002-10-01 |
| 6436605 | Plasma resistant composition and use thereof | Marie Angelopoulos, Ari Aviram, Edward D. Babich, Timothy A. Brunner, Thomas B. Faure +2 more | 2002-08-20 |
| 6420088 | Antireflective silicon-containing compositions as hardmask layer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Wayne M. Moreau | 2002-07-16 |
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Robert N. Lang +3 more | 2002-07-16 |
| 6346362 | Polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, David R. Medeiros | 2002-02-12 |
| 6265134 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Pushkara R. Varanasi, Ahmad D. Katnani, Mahmoud Khojasteh | 2001-07-24 |
| 6245492 | Photoresist system and process for aerial image enhancement | Wu-Song Huang, Ahmad D. Katnani, Kathleen H. Martinek | 2001-06-12 |
| 6171757 | Organometallic polymers and use thereof | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri | 2001-01-09 |
| 6153696 | Process for forming carbonates of hydroxyaromatic compounds | Gregory Breyta, Daniel J. Dawson, Moahmoud Mostafa Khojasteh, Elwood Herbert Macy, David Paul Merritt +5 more | 2000-11-28 |
| 6140015 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Pushkara R. Varanasi, Ahmad D. Katnani, Mahmoud Khojasteh | 2000-10-31 |
| 5322765 | Dry developable photoresist compositions and method for use thereof | Nicholas J. Clecak, Willard E. Conley, Leo L. Linehan, Scott A. MacDonald, Harbans S. Sachdev +2 more | 1994-06-21 |
| 5307357 | Protection means for ridge waveguide laser structures using thick organic films | Mark E. Jost, Abbas Behfar-Rad, Peter Kwan | 1994-04-26 |
| 5296332 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | Harbans S. Sachdev, Willard E. Conley, Premlatha Jagannathan, Ahmad D. Katnani, Leo L. Linehan +2 more | 1994-03-22 |
| 5240812 | Top coat for acid catalyzed resists | Willard E. Conley, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons, Steve S. Miura +3 more | 1993-08-31 |
| 5114826 | Photosensitive polyimide compositions | Harbans S. Sachdev, Krishna G. Sachdev | 1992-05-19 |
| 5115090 | Viscosity stable, essentially gel-free polyamic acid compositions | Krishna G. Sachdev, John P. Hummel, Robert N. Lang, Leo L. Linehan, Harbans S. Sachdev | 1992-05-19 |
| 4978594 | Fluorine-containing base layer for multi-layer resist processes | James A. Bruce, Michael L. Kerbaugh, Tanya N. Lee, Harold G. Linde, Harbans S. Sachdev | 1990-12-18 |
| 4692205 | Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings | Krishna G. Sachdev, Mani R. Gupta, Mark S. Chace, Harbans S. Sachdev | 1987-09-08 |
| 4665006 | Positive resist system having high resistance to oxygen reactive ion etching | Krishna G. Sachdev, Mahmoud Khojasteh, Harbans S. Sachdev | 1987-05-12 |