Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Willard E. Conley — 28 Patents

IBM: 16 patents #6,980 of 70,183Top 10%
CYCymer: 8 patents #57 of 339Top 20%
FSFreeescale Semiconductor: 5 patents #628 of 3,767Top 20%
Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
SLShipley Company, L.L.C.: 1 patents #226 of 401Top 60%
Austin, TX: #1,113 of 18,064 inventorsTop 7%
Texas: #4,355 of 125,132 inventorsTop 4%
Overall (All Time): #134,628 of 4,157,543Top 4%
28 Patents All Time
Willard E. Conley has been granted 28 US patents while listed as an inventor at IBM. The first was granted in 1989 and the most recent in June 2024. Willard E. Conley ranks #134,628 of 4,157,543 US inventors in our database (top 3.2%). Patent records list Willard E. Conley in Austin, TX, US.

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12001144 Forming multiple aerial images in a single lithography exposure pass Joshua Jon Thornes, Gregory Allen Rechtsteiner 2024-06-04
11747739 Method and apparatus for imaging using narrowed bandwidth Joshua Jon Thornes, Duan-Fu Stephen Hsu 2023-09-05 $130,527,000
11526082 Forming multiple aerial images in a single lithography exposure pass Joshua Jon Thornes, Gregory Allen Rechtsteiner 2022-12-13
10416566 Optimization of source and bandwidth for new and existing patterning devices Wei-An Hsieh, Tsann-Bim Chiou, Cheng-Hsien Hsieh 2019-09-17
10268123 Wafer-based light source parameter control Eric Anders Mason, Omar Zurita, Gregory Allen Rechtsteiner 2019-04-23
9997888 Control of a spectral feature of a pulsed light beam Eric Anders Mason, Joshua Jon Thornes 2018-06-12
9989866 Wafer-based light source parameter control Eric Anders Mason, Omar Zurita, Gregory Allen Rechtsteiner 2018-06-05
9835959 Controlling for wafer stage vibration Eric Anders Mason, Paulus Jacobus Maria VAN ADRICHEM 2017-12-05
9229051 Integrated circuit with degradation monitoring Puneet Sharma, Matthew A. Thompson 2016-01-05
8507187 Multi-exposure lithography employing a single anti-reflective coating layer Veeraraghavan S. Basker, Steven J. Holmes, David V. Horak 2013-08-13
8119334 Method of making a semiconductor device using negative photoresist 2012-02-21 $5,308,000
7883829 Lithography for pitch reduction Steven J. Holmes, Xuefeng Hua 2011-02-08 $4,016,000
7741221 Method of forming a semiconductor device having dummy features Ruiqi Tian, Mehul D. Shroff 2010-06-22
6300035 Chemically amplified positive photoresists James W. Thackeray, Peter R. Hagerty, James F. Cameron, Wu-Song Huang, Ahmad D. Katnani 2001-10-09 $29,916,000
6207353 Resist formulation which minimizes blistering during etching Michael D. Armacost, Tina J. Cotler-Wagner, Ronald A. DellaGuardia, David M. Dobuzinsky, Michael L. Passow +1 more 2001-03-27 $29,796,000
5795701 Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound James T. Fahey, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh 1998-08-18 $11,146,000
5783361 Microlithographic structure with an underlayer film containing a thermolyzed azide compound James T. Fahey, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh 1998-07-21 $12,143,000
5663036 Microlithographic structure with an underlayer film comprising a thermolyzed azide James T. Fahey, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh 1997-09-02 $11,536,000
5644038 Quinone diazo compound containing non-metallic atom Ari Aviram, William R. Brunsvold, Daniel Bucca, David E. Seeger 1997-07-01 $13,721,000
5567569 Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring Ari Aviram, William R. Brunsvold, Daniel Bucca, David E. Seeger 1996-10-22 $11,193,000
5552256 Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring Ari Aviram, William R. Brunsvold, Daniel Bucca, David E. Seeger 1996-09-03 $8,127,000
5322765 Dry developable photoresist compositions and method for use thereof Nicholas J. Clecak, Ranee W. Kwong, Leo L. Linehan, Scott A. MacDonald, Harbans S. Sachdev +2 more 1994-06-21 $13,003,000
5296332 Crosslinkable aqueous developable photoresist compositions and method for use thereof Harbans S. Sachdev, Premlatha Jagannathan, Ahmad D. Katnani, Ranee W. Kwong, Leo L. Linehan +2 more 1994-03-22 $7,732,000
5240812 Top coat for acid catalyzed resists Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons, Steve S. Miura +3 more 1993-08-31 $6,793,000
5023164 Highly sensitive dry developable deep UV photoresist William R. Brunsvold, Philip Chiu, Dale M. Crockatt, Melvin Montgomery, Wayne M. Moreau 1991-06-11 $12,432,000