Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12001144 | Forming multiple aerial images in a single lithography exposure pass | Joshua Jon Thornes, Gregory Allen Rechtsteiner | 2024-06-04 |
| 11747739 | Method and apparatus for imaging using narrowed bandwidth | Joshua Jon Thornes, Duan-Fu Stephen Hsu | 2023-09-05 |
| 11526082 | Forming multiple aerial images in a single lithography exposure pass | Joshua Jon Thornes, Gregory Allen Rechtsteiner | 2022-12-13 |
| 10416566 | Optimization of source and bandwidth for new and existing patterning devices | Wei-An Hsieh, Tsann-Bim Chiou, Cheng-Hsien Hsieh | 2019-09-17 |
| 10268123 | Wafer-based light source parameter control | Eric Anders Mason, Omar Zurita, Gregory Allen Rechtsteiner | 2019-04-23 |
| 9997888 | Control of a spectral feature of a pulsed light beam | Eric Anders Mason, Joshua Jon Thornes | 2018-06-12 |
| 9989866 | Wafer-based light source parameter control | Eric Anders Mason, Omar Zurita, Gregory Allen Rechtsteiner | 2018-06-05 |
| 9835959 | Controlling for wafer stage vibration | Eric Anders Mason, Paulus Jacobus Maria VAN ADRICHEM | 2017-12-05 |
| 9229051 | Integrated circuit with degradation monitoring | Puneet Sharma, Matthew A. Thompson | 2016-01-05 |
| 8507187 | Multi-exposure lithography employing a single anti-reflective coating layer | Veeraraghavan S. Basker, Steven J. Holmes, David V. Horak | 2013-08-13 |
| 8119334 | Method of making a semiconductor device using negative photoresist | — | 2012-02-21 |
| 7883829 | Lithography for pitch reduction | Steven J. Holmes, Xuefeng Hua | 2011-02-08 |
| 7741221 | Method of forming a semiconductor device having dummy features | Ruiqi Tian, Mehul D. Shroff | 2010-06-22 |
| 6300035 | Chemically amplified positive photoresists | James W. Thackeray, Peter R. Hagerty, James F. Cameron, Wu-Song Huang, Ahmad D. Katnani | 2001-10-09 |
| 6207353 | Resist formulation which minimizes blistering during etching | Michael D. Armacost, Tina J. Cotler-Wagner, Ronald A. DellaGuardia, David M. Dobuzinsky, Michael L. Passow +1 more | 2001-03-27 |
| 5795701 | Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound | James T. Fahey, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh | 1998-08-18 |
| 5783361 | Microlithographic structure with an underlayer film containing a thermolyzed azide compound | James T. Fahey, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh | 1998-07-21 |
| 5663036 | Microlithographic structure with an underlayer film comprising a thermolyzed azide | James T. Fahey, Wayne M. Moreau, Ratnam Sooriyakumaran, Kevin M. Welsh | 1997-09-02 |
| 5644038 | Quinone diazo compound containing non-metallic atom | Ari Aviram, William R. Brunsvold, Daniel Bucca, David E. Seeger | 1997-07-01 |
| 5567569 | Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring | Ari Aviram, William R. Brunsvold, Daniel Bucca, David E. Seeger | 1996-10-22 |
| 5552256 | Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring | Ari Aviram, William R. Brunsvold, Daniel Bucca, David E. Seeger | 1996-09-03 |
| 5322765 | Dry developable photoresist compositions and method for use thereof | Nicholas J. Clecak, Ranee W. Kwong, Leo L. Linehan, Scott A. MacDonald, Harbans S. Sachdev +2 more | 1994-06-21 |
| 5296332 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | Harbans S. Sachdev, Premlatha Jagannathan, Ahmad D. Katnani, Ranee W. Kwong, Leo L. Linehan +2 more | 1994-03-22 |
| 5240812 | Top coat for acid catalyzed resists | Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons, Steve S. Miura +3 more | 1993-08-31 |
| 5023164 | Highly sensitive dry developable deep UV photoresist | William R. Brunsvold, Philip Chiu, Dale M. Crockatt, Melvin Montgomery, Wayne M. Moreau | 1991-06-11 |